Array substrate and manufacturing method thereof
The invention relates to a method for manufacturing an array substrate, comprising the following steps: a gate electrode and a gate dielectric layer are successively formed on the substrate; a semiconductor layer, an etching stop layer, a hard film layer and a second patterning photoresist. The phot...
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| creator | ZHOU QIWEI CHEN YUHONG CHEN JIAYU ZHANG FANWEI GU HUILING DING HONGZHE ZHONG YIZHEN LV XUEXING |
| description | The invention relates to a method for manufacturing an array substrate, comprising the following steps: a gate electrode and a gate dielectric layer are successively formed on the substrate; a semiconductor layer, an etching stop layer, a hard film layer and a second patterning photoresist. The photoresist is used for etching process of the hard film layer so as to form patterning hard film layer, and is used for first etching process of the etching stop layer, and is used for second etching process of the semiconductor layer so as to form a patterning semiconductor layer. The etching stop layer which is not coated by the patterning hard film layer is removed to form the patterning etching stop layer. |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Array substrate and manufacturing method thereof |
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