Vacuum coating apparatus

An inline vacuum processing apparatus for processing of substrates in vacuum comprises at least one load-lock chamber, at least two subsequent deposition chambers to be operated with essentially the same set of coating parameters and at least one unload-lock chamber plus means for transferring, post...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: POPPELLER MARKUS, ZIMIN DMITRY, ZINDEL ARNO, KUHN HANSJORG, KERSCHBAUMER JORG
Format: Patent
Sprache:chi ; eng
Schlagworte:
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