Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditionin...
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| creator | VAN GOMPEL EDWIN AUGUSTINUS MA VAN DER MEULEN FRITS SIMONS WILHELMUS FRANCISCUS JO LEENDERS MARTINUS HENDRIKUS AN KUSTERS GERARDUS ADRIANUS ANTO OTTENS JOOST JEROEN DE JONG FREDERIK EDUARD VAN BAREN MARTIJN SMEETS MARTIN FRANS PIERRE CUIJPERS MARTINUS AGNES WILLEM CADEE THEODORUS PETRUS MARIA WIJCKMANS MAURICE JANSEN ROB |
| description | A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN102495539A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN102495539A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN102495539A3</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGRiaWpqbGlo7GxKgBANU7LhA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>VAN GOMPEL EDWIN AUGUSTINUS MA ; VAN DER MEULEN FRITS ; SIMONS WILHELMUS FRANCISCUS JO ; LEENDERS MARTINUS HENDRIKUS AN ; KUSTERS GERARDUS ADRIANUS ANTO ; OTTENS JOOST JEROEN ; DE JONG FREDERIK EDUARD ; VAN BAREN MARTIJN ; SMEETS MARTIN FRANS PIERRE ; CUIJPERS MARTINUS AGNES WILLEM ; CADEE THEODORUS PETRUS MARIA ; WIJCKMANS MAURICE ; JANSEN ROB</creator><creatorcontrib>VAN GOMPEL EDWIN AUGUSTINUS MA ; VAN DER MEULEN FRITS ; SIMONS WILHELMUS FRANCISCUS JO ; LEENDERS MARTINUS HENDRIKUS AN ; KUSTERS GERARDUS ADRIANUS ANTO ; OTTENS JOOST JEROEN ; DE JONG FREDERIK EDUARD ; VAN BAREN MARTIJN ; SMEETS MARTIN FRANS PIERRE ; CUIJPERS MARTINUS AGNES WILLEM ; CADEE THEODORUS PETRUS MARIA ; WIJCKMANS MAURICE ; JANSEN ROB</creatorcontrib><description>A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BLASTING ; CINEMATOGRAPHY ; ELECTROGRAPHY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; HOLOGRAPHY ; JOINTS OR FITTINGS FOR PIPES ; LIGHTING ; MATERIALS THEREFOR ; MEANS FOR THERMAL INSULATION IN GENERAL ; MECHANICAL ENGINEERING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PIPES ; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING ; THERMAL INSULATION IN GENERAL ; WEAPONS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120613&DB=EPODOC&CC=CN&NR=102495539A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76292</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120613&DB=EPODOC&CC=CN&NR=102495539A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN GOMPEL EDWIN AUGUSTINUS MA</creatorcontrib><creatorcontrib>VAN DER MEULEN FRITS</creatorcontrib><creatorcontrib>SIMONS WILHELMUS FRANCISCUS JO</creatorcontrib><creatorcontrib>LEENDERS MARTINUS HENDRIKUS AN</creatorcontrib><creatorcontrib>KUSTERS GERARDUS ADRIANUS ANTO</creatorcontrib><creatorcontrib>OTTENS JOOST JEROEN</creatorcontrib><creatorcontrib>DE JONG FREDERIK EDUARD</creatorcontrib><creatorcontrib>VAN BAREN MARTIJN</creatorcontrib><creatorcontrib>SMEETS MARTIN FRANS PIERRE</creatorcontrib><creatorcontrib>CUIJPERS MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>CADEE THEODORUS PETRUS MARIA</creatorcontrib><creatorcontrib>WIJCKMANS MAURICE</creatorcontrib><creatorcontrib>JANSEN ROB</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>JOINTS OR FITTINGS FOR PIPES</subject><subject>LIGHTING</subject><subject>MATERIALS THEREFOR</subject><subject>MEANS FOR THERMAL INSULATION IN GENERAL</subject><subject>MECHANICAL ENGINEERING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PIPES</subject><subject>SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoYGRiaWpqbGlo7GxKgBANU7LhA</recordid><startdate>20120613</startdate><enddate>20120613</enddate><creator>VAN GOMPEL EDWIN AUGUSTINUS MA</creator><creator>VAN DER MEULEN FRITS</creator><creator>SIMONS WILHELMUS FRANCISCUS JO</creator><creator>LEENDERS MARTINUS HENDRIKUS AN</creator><creator>KUSTERS GERARDUS ADRIANUS ANTO</creator><creator>OTTENS JOOST JEROEN</creator><creator>DE JONG FREDERIK EDUARD</creator><creator>VAN BAREN MARTIJN</creator><creator>SMEETS MARTIN FRANS PIERRE</creator><creator>CUIJPERS MARTINUS AGNES WILLEM</creator><creator>CADEE THEODORUS PETRUS MARIA</creator><creator>WIJCKMANS MAURICE</creator><creator>JANSEN ROB</creator><scope>EVB</scope></search><sort><creationdate>20120613</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>VAN GOMPEL EDWIN AUGUSTINUS MA ; VAN DER MEULEN FRITS ; SIMONS WILHELMUS FRANCISCUS JO ; LEENDERS MARTINUS HENDRIKUS AN ; KUSTERS GERARDUS ADRIANUS ANTO ; OTTENS JOOST JEROEN ; DE JONG FREDERIK EDUARD ; VAN BAREN MARTIJN ; SMEETS MARTIN FRANS PIERRE ; CUIJPERS MARTINUS AGNES WILLEM ; CADEE THEODORUS PETRUS MARIA ; WIJCKMANS MAURICE ; JANSEN ROB</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN102495539A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2012</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>JOINTS OR FITTINGS FOR PIPES</topic><topic>LIGHTING</topic><topic>MATERIALS THEREFOR</topic><topic>MEANS FOR THERMAL INSULATION IN GENERAL</topic><topic>MECHANICAL ENGINEERING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PIPES</topic><topic>SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN GOMPEL EDWIN AUGUSTINUS MA</creatorcontrib><creatorcontrib>VAN DER MEULEN FRITS</creatorcontrib><creatorcontrib>SIMONS WILHELMUS FRANCISCUS JO</creatorcontrib><creatorcontrib>LEENDERS MARTINUS HENDRIKUS AN</creatorcontrib><creatorcontrib>KUSTERS GERARDUS ADRIANUS ANTO</creatorcontrib><creatorcontrib>OTTENS JOOST JEROEN</creatorcontrib><creatorcontrib>DE JONG FREDERIK EDUARD</creatorcontrib><creatorcontrib>VAN BAREN MARTIJN</creatorcontrib><creatorcontrib>SMEETS MARTIN FRANS PIERRE</creatorcontrib><creatorcontrib>CUIJPERS MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>CADEE THEODORUS PETRUS MARIA</creatorcontrib><creatorcontrib>WIJCKMANS MAURICE</creatorcontrib><creatorcontrib>JANSEN ROB</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN GOMPEL EDWIN AUGUSTINUS MA</au><au>VAN DER MEULEN FRITS</au><au>SIMONS WILHELMUS FRANCISCUS JO</au><au>LEENDERS MARTINUS HENDRIKUS AN</au><au>KUSTERS GERARDUS ADRIANUS ANTO</au><au>OTTENS JOOST JEROEN</au><au>DE JONG FREDERIK EDUARD</au><au>VAN BAREN MARTIJN</au><au>SMEETS MARTIN FRANS PIERRE</au><au>CUIJPERS MARTINUS AGNES WILLEM</au><au>CADEE THEODORUS PETRUS MARIA</au><au>WIJCKMANS MAURICE</au><au>JANSEN ROB</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2012-06-13</date><risdate>2012</risdate><abstract>A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY ELECTROGRAPHY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY JOINTS OR FITTINGS FOR PIPES LIGHTING MATERIALS THEREFOR MEANS FOR THERMAL INSULATION IN GENERAL MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PIPES SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING THERMAL INSULATION IN GENERAL WEAPONS |
| title | Lithographic apparatus and device manufacturing method |
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