Manufacturing method of adjustable FP (filter pass) optical filter based on MEMS (micro electro mechanical system) process

The invention relates to a manufacturing method of an adjustable FP (filter pass) optical filter based on an MEMS (micro electro mechanical system) process, which is characterized in that the etching window of all graphs is manufactured by adopting the etching twice; the manufacturing of a middle FP air cavity and a movable reflector surface structure is finished by adopting the plasma silicon etching once; a movable silicon membrane reflector is manufactured by adopting the processes such as the silicon-silicon bonding, the plasma dry etching, the HF (hydrogen fluoride) acid etching and the silicon oxide layer releasing once; the high-reflection membrane and anti-reflection membrane of the two reflectors in the FP cavity are manufactured by adopting a method for selecting evaporation through a hard template; and a final FP cavity filter is formed by adopting the silicon-glass bonding once. In the manufacturing method provided by the invention, the process procedures are greatly simplified; the mirror finish