Vacuum pumping device, vacuum processing device, and vacuum processing method
Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pum...
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creator | ASARI SHIN OSONO SHUJI FURUYA SHINJI KOMURO TAKU SAITO KAZUYA MASUDA YUKIO |
description | Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11). |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN102171455A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN102171455A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN102171455A3</originalsourceid><addsrcrecordid>eNrjZPANS0wuLc1VKCjNLcjMS1dISS3LTE7VUSiDChflJ6cWFyPLJOalYJHNTS3JyE_hYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBkaG5oYmpqaOxsSoAQDlzDZB</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vacuum pumping device, vacuum processing device, and vacuum processing method</title><source>esp@cenet</source><creator>ASARI SHIN ; OSONO SHUJI ; FURUYA SHINJI ; KOMURO TAKU ; SAITO KAZUYA ; MASUDA YUKIO</creator><creatorcontrib>ASARI SHIN ; OSONO SHUJI ; FURUYA SHINJI ; KOMURO TAKU ; SAITO KAZUYA ; MASUDA YUKIO</creatorcontrib><description>Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11).</description><language>chi ; eng</language><subject>BLASTING ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS ; PUMPS ; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ; WEAPONS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110831&DB=EPODOC&CC=CN&NR=102171455A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110831&DB=EPODOC&CC=CN&NR=102171455A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ASARI SHIN</creatorcontrib><creatorcontrib>OSONO SHUJI</creatorcontrib><creatorcontrib>FURUYA SHINJI</creatorcontrib><creatorcontrib>KOMURO TAKU</creatorcontrib><creatorcontrib>SAITO KAZUYA</creatorcontrib><creatorcontrib>MASUDA YUKIO</creatorcontrib><title>Vacuum pumping device, vacuum processing device, and vacuum processing method</title><description>Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11).</description><subject>BLASTING</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</subject><subject>PUMPS</subject><subject>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPANS0wuLc1VKCjNLcjMS1dISS3LTE7VUSiDChflJ6cWFyPLJOalYJHNTS3JyE_hYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBkaG5oYmpqaOxsSoAQDlzDZB</recordid><startdate>20110831</startdate><enddate>20110831</enddate><creator>ASARI SHIN</creator><creator>OSONO SHUJI</creator><creator>FURUYA SHINJI</creator><creator>KOMURO TAKU</creator><creator>SAITO KAZUYA</creator><creator>MASUDA YUKIO</creator><scope>EVB</scope></search><sort><creationdate>20110831</creationdate><title>Vacuum pumping device, vacuum processing device, and vacuum processing method</title><author>ASARI SHIN ; OSONO SHUJI ; FURUYA SHINJI ; KOMURO TAKU ; SAITO KAZUYA ; MASUDA YUKIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN102171455A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>BLASTING</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</topic><topic>PUMPS</topic><topic>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>ASARI SHIN</creatorcontrib><creatorcontrib>OSONO SHUJI</creatorcontrib><creatorcontrib>FURUYA SHINJI</creatorcontrib><creatorcontrib>KOMURO TAKU</creatorcontrib><creatorcontrib>SAITO KAZUYA</creatorcontrib><creatorcontrib>MASUDA YUKIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ASARI SHIN</au><au>OSONO SHUJI</au><au>FURUYA SHINJI</au><au>KOMURO TAKU</au><au>SAITO KAZUYA</au><au>MASUDA YUKIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum pumping device, vacuum processing device, and vacuum processing method</title><date>2011-08-31</date><risdate>2011</risdate><abstract>Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11).</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | BLASTING HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS |
title | Vacuum pumping device, vacuum processing device, and vacuum processing method |
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