Method for judging optical proximity correction

The invention relates to a method for judging optical proximity correction, which comprises the following steps: providing an optical mask plate having an original pattern; dividing the original pattern of the optical mask plate into a plurality of sub-patterns; performing optical proximity correction on at least one of the sub-patterns and acquiring at least one corrected sub-pattern and a corresponding mask error enhancing factor; providing a threshold value of the mask error enhancing factor; if the corresponding mask error enhancing factor of the corrected sub-pattern is less than the threshold value of the mask error enhancing factor, accepting the correction for the corrected sub-pattern; if the corresponding mask error enhancing factor of the corrected sub-pattern is not less than the threshold value of the mask error enhancing factor, judging again; if the corrected sub-pattern meets the demand of process limit, accepting the correction for the corrected sub-pattern; and if the corrected sub-pattern d