Substrate processing method, program and computer storage medium

The present invention provides a substrate processing method, program and a computer storage medium. The supply amount of the secondary resist in double patterning is controlled to a small amount, and furthermore a preset resist pattern is formed on the substrate. Resist solution is coated on a wafe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NIWA TAKAFUMI, HONTAKE KOICHI, KIDA HIDEJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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