Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate

Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in sai...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VUGTS JOSEPHUS C. J. A, KLOMP ALBERT J. H, FRANSSEN JOHANNES H. G, VULLINGS HENRICUS J. L. M, KUIPERS LEO W. M, VISSER RAIMOND, HOOGKAMP JAN F
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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