Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate

Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in sai...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: VUGTS JOSEPHUS C. J. A, KLOMP ALBERT J. H, FRANSSEN JOHANNES H. G, VULLINGS HENRICUS J. L. M, KUIPERS LEO W. M, VISSER RAIMOND, HOOGKAMP JAN F
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator VUGTS JOSEPHUS C. J. A
KLOMP ALBERT J. H
FRANSSEN JOHANNES H. G
VULLINGS HENRICUS J. L. M
KUIPERS LEO W. M
VISSER RAIMOND
HOOGKAMP JAN F
description Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN101986208A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN101986208A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN101986208A3</originalsourceid><addsrcrecordid>eNqNzL0KwjAUhuEsDqLew3FXaBWkjlIUB3FyL8f0pAnmj5zk_o3QC3D6luf9loIeAUewQX52YE3WYUoYtZGAMWLCXBhkcDEZNn4CLlIDVj43gH4ERzUbIShw6ItCmUv6Yaz8zbme0FosFFqmzbwrsb1dX_19TzEMxBElecpD_2yb9tydDk13Of5jvgQcPwk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate</title><source>esp@cenet</source><creator>VUGTS JOSEPHUS C. J. A ; KLOMP ALBERT J. H ; FRANSSEN JOHANNES H. G ; VULLINGS HENRICUS J. L. M ; KUIPERS LEO W. M ; VISSER RAIMOND ; HOOGKAMP JAN F</creator><creatorcontrib>VUGTS JOSEPHUS C. J. A ; KLOMP ALBERT J. H ; FRANSSEN JOHANNES H. G ; VULLINGS HENRICUS J. L. M ; KUIPERS LEO W. M ; VISSER RAIMOND ; HOOGKAMP JAN F</creatorcontrib><description>Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110316&amp;DB=EPODOC&amp;CC=CN&amp;NR=101986208A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110316&amp;DB=EPODOC&amp;CC=CN&amp;NR=101986208A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VUGTS JOSEPHUS C. J. A</creatorcontrib><creatorcontrib>KLOMP ALBERT J. H</creatorcontrib><creatorcontrib>FRANSSEN JOHANNES H. G</creatorcontrib><creatorcontrib>VULLINGS HENRICUS J. L. M</creatorcontrib><creatorcontrib>KUIPERS LEO W. M</creatorcontrib><creatorcontrib>VISSER RAIMOND</creatorcontrib><creatorcontrib>HOOGKAMP JAN F</creatorcontrib><title>Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate</title><description>Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzL0KwjAUhuEsDqLew3FXaBWkjlIUB3FyL8f0pAnmj5zk_o3QC3D6luf9loIeAUewQX52YE3WYUoYtZGAMWLCXBhkcDEZNn4CLlIDVj43gH4ERzUbIShw6ItCmUv6Yaz8zbme0FosFFqmzbwrsb1dX_19TzEMxBElecpD_2yb9tydDk13Of5jvgQcPwk</recordid><startdate>20110316</startdate><enddate>20110316</enddate><creator>VUGTS JOSEPHUS C. J. A</creator><creator>KLOMP ALBERT J. H</creator><creator>FRANSSEN JOHANNES H. G</creator><creator>VULLINGS HENRICUS J. L. M</creator><creator>KUIPERS LEO W. M</creator><creator>VISSER RAIMOND</creator><creator>HOOGKAMP JAN F</creator><scope>EVB</scope></search><sort><creationdate>20110316</creationdate><title>Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate</title><author>VUGTS JOSEPHUS C. J. A ; KLOMP ALBERT J. H ; FRANSSEN JOHANNES H. G ; VULLINGS HENRICUS J. L. M ; KUIPERS LEO W. M ; VISSER RAIMOND ; HOOGKAMP JAN F</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101986208A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>VUGTS JOSEPHUS C. J. A</creatorcontrib><creatorcontrib>KLOMP ALBERT J. H</creatorcontrib><creatorcontrib>FRANSSEN JOHANNES H. G</creatorcontrib><creatorcontrib>VULLINGS HENRICUS J. L. M</creatorcontrib><creatorcontrib>KUIPERS LEO W. M</creatorcontrib><creatorcontrib>VISSER RAIMOND</creatorcontrib><creatorcontrib>HOOGKAMP JAN F</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VUGTS JOSEPHUS C. J. A</au><au>KLOMP ALBERT J. H</au><au>FRANSSEN JOHANNES H. G</au><au>VULLINGS HENRICUS J. L. M</au><au>KUIPERS LEO W. M</au><au>VISSER RAIMOND</au><au>HOOGKAMP JAN F</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate</title><date>2011-03-16</date><risdate>2011</risdate><abstract>Load lock for a lithographic apparatus arranged to transfer an object, like a substrate (W), into and from the lithographic apparatus. The load lock outer wall (38'; 40) defining at least part of a load lock volume accommodating a support unit (33; 141) for supporting the object (W) when in said load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN101986208A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T22%3A59%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VUGTS%20JOSEPHUS%20C.%20J.%20A&rft.date=2011-03-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN101986208A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true