Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof

The invention discloses a cathodic protection monitoring probe, a cathodic protection monitoring probe monitoring system, and a manufacturing method and a monitoring method thereof. The probe main body is integrally cylindrical; the probe core is integrally cylindrical and is provided with a hollow...

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Hauptverfasser: LUO SHA, ZHAO KAOSHENG, XU GUANGLU, CAO YEMING, ZHANG WEIHUA, LI GUANGZHI, LIU GUOQING, WU SHUXIANG, CHENG QINGCHEN, DU TIESUO, JIAO LINA, LIU XUEGONG
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creator LUO SHA
ZHAO KAOSHENG
XU GUANGLU
CAO YEMING
ZHANG WEIHUA
LI GUANGZHI
LIU GUOQING
WU SHUXIANG
CHENG QINGCHEN
DU TIESUO
JIAO LINA
LIU XUEGONG
description The invention discloses a cathodic protection monitoring probe, a cathodic protection monitoring probe monitoring system, and a manufacturing method and a monitoring method thereof. The probe main body is integrally cylindrical; the probe core is integrally cylindrical and is provided with a hollow blind hole; the hollow hole is a probe core cavity; the upper part of the probe core is provided with an electrode threaded hole which passes through the cylindrical wall of the probe core and is communicated with the probe core cavity; the probe core cavity is provided with a reference electrode; and a fixing layer is arranged between the reference electrode and the cylindrical wall of the probe core so as to fix the reference electrode in the probe core. The cathodic protection monitoring probe has the advantages of scientific design, reasonable structure, reliable performance, wide application range, high stability, strong polarization resistance, and stable quality, and is used for pipeline transportation of va
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN101857957A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN101857957A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN101857957A3</originalsourceid><addsrcrecordid>eNrjZJjinFiSkZ-SmaxQUJRfkppckpmfp5Cbn5dZkl-UmZcOEk1K1VFIJkIVskBxZXFJaq6OQmJeikJuYl5pWmJySSlYJjcVZBJEAqEeKlqSkVqUmp_Gw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwsSk1PzUkvinf0MDQwtTM0tTc0djYlRAwAJYVKL</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof</title><source>esp@cenet</source><creator>LUO SHA ; ZHAO KAOSHENG ; XU GUANGLU ; CAO YEMING ; ZHANG WEIHUA ; LI GUANGZHI ; LIU GUOQING ; WU SHUXIANG ; CHENG QINGCHEN ; DU TIESUO ; JIAO LINA ; LIU XUEGONG</creator><creatorcontrib>LUO SHA ; ZHAO KAOSHENG ; XU GUANGLU ; CAO YEMING ; ZHANG WEIHUA ; LI GUANGZHI ; LIU GUOQING ; WU SHUXIANG ; CHENG QINGCHEN ; DU TIESUO ; JIAO LINA ; LIU XUEGONG</creatorcontrib><description>The invention discloses a cathodic protection monitoring probe, a cathodic protection monitoring probe monitoring system, and a manufacturing method and a monitoring method thereof. The probe main body is integrally cylindrical; the probe core is integrally cylindrical and is provided with a hollow blind hole; the hollow hole is a probe core cavity; the upper part of the probe core is provided with an electrode threaded hole which passes through the cylindrical wall of the probe core and is communicated with the probe core cavity; the probe core cavity is provided with a reference electrode; and a fixing layer is arranged between the reference electrode and the cylindrical wall of the probe core so as to fix the reference electrode in the probe core. The cathodic protection monitoring probe has the advantages of scientific design, reasonable structure, reliable performance, wide application range, high stability, strong polarization resistance, and stable quality, and is used for pipeline transportation of va</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20101013&amp;DB=EPODOC&amp;CC=CN&amp;NR=101857957A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20101013&amp;DB=EPODOC&amp;CC=CN&amp;NR=101857957A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LUO SHA</creatorcontrib><creatorcontrib>ZHAO KAOSHENG</creatorcontrib><creatorcontrib>XU GUANGLU</creatorcontrib><creatorcontrib>CAO YEMING</creatorcontrib><creatorcontrib>ZHANG WEIHUA</creatorcontrib><creatorcontrib>LI GUANGZHI</creatorcontrib><creatorcontrib>LIU GUOQING</creatorcontrib><creatorcontrib>WU SHUXIANG</creatorcontrib><creatorcontrib>CHENG QINGCHEN</creatorcontrib><creatorcontrib>DU TIESUO</creatorcontrib><creatorcontrib>JIAO LINA</creatorcontrib><creatorcontrib>LIU XUEGONG</creatorcontrib><title>Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof</title><description>The invention discloses a cathodic protection monitoring probe, a cathodic protection monitoring probe monitoring system, and a manufacturing method and a monitoring method thereof. The probe main body is integrally cylindrical; the probe core is integrally cylindrical and is provided with a hollow blind hole; the hollow hole is a probe core cavity; the upper part of the probe core is provided with an electrode threaded hole which passes through the cylindrical wall of the probe core and is communicated with the probe core cavity; the probe core cavity is provided with a reference electrode; and a fixing layer is arranged between the reference electrode and the cylindrical wall of the probe core so as to fix the reference electrode in the probe core. The cathodic protection monitoring probe has the advantages of scientific design, reasonable structure, reliable performance, wide application range, high stability, strong polarization resistance, and stable quality, and is used for pipeline transportation of va</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJjinFiSkZ-SmaxQUJRfkppckpmfp5Cbn5dZkl-UmZcOEk1K1VFIJkIVskBxZXFJaq6OQmJeikJuYl5pWmJySSlYJjcVZBJEAqEeKlqSkVqUmp_Gw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwsSk1PzUkvinf0MDQwtTM0tTc0djYlRAwAJYVKL</recordid><startdate>20101013</startdate><enddate>20101013</enddate><creator>LUO SHA</creator><creator>ZHAO KAOSHENG</creator><creator>XU GUANGLU</creator><creator>CAO YEMING</creator><creator>ZHANG WEIHUA</creator><creator>LI GUANGZHI</creator><creator>LIU GUOQING</creator><creator>WU SHUXIANG</creator><creator>CHENG QINGCHEN</creator><creator>DU TIESUO</creator><creator>JIAO LINA</creator><creator>LIU XUEGONG</creator><scope>EVB</scope></search><sort><creationdate>20101013</creationdate><title>Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof</title><author>LUO SHA ; ZHAO KAOSHENG ; XU GUANGLU ; CAO YEMING ; ZHANG WEIHUA ; LI GUANGZHI ; LIU GUOQING ; WU SHUXIANG ; CHENG QINGCHEN ; DU TIESUO ; JIAO LINA ; LIU XUEGONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101857957A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2010</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><toplevel>online_resources</toplevel><creatorcontrib>LUO SHA</creatorcontrib><creatorcontrib>ZHAO KAOSHENG</creatorcontrib><creatorcontrib>XU GUANGLU</creatorcontrib><creatorcontrib>CAO YEMING</creatorcontrib><creatorcontrib>ZHANG WEIHUA</creatorcontrib><creatorcontrib>LI GUANGZHI</creatorcontrib><creatorcontrib>LIU GUOQING</creatorcontrib><creatorcontrib>WU SHUXIANG</creatorcontrib><creatorcontrib>CHENG QINGCHEN</creatorcontrib><creatorcontrib>DU TIESUO</creatorcontrib><creatorcontrib>JIAO LINA</creatorcontrib><creatorcontrib>LIU XUEGONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LUO SHA</au><au>ZHAO KAOSHENG</au><au>XU GUANGLU</au><au>CAO YEMING</au><au>ZHANG WEIHUA</au><au>LI GUANGZHI</au><au>LIU GUOQING</au><au>WU SHUXIANG</au><au>CHENG QINGCHEN</au><au>DU TIESUO</au><au>JIAO LINA</au><au>LIU XUEGONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof</title><date>2010-10-13</date><risdate>2010</risdate><abstract>The invention discloses a cathodic protection monitoring probe, a cathodic protection monitoring probe monitoring system, and a manufacturing method and a monitoring method thereof. The probe main body is integrally cylindrical; the probe core is integrally cylindrical and is provided with a hollow blind hole; the hollow hole is a probe core cavity; the upper part of the probe core is provided with an electrode threaded hole which passes through the cylindrical wall of the probe core and is communicated with the probe core cavity; the probe core cavity is provided with a reference electrode; and a fixing layer is arranged between the reference electrode and the cylindrical wall of the probe core so as to fix the reference electrode in the probe core. The cathodic protection monitoring probe has the advantages of scientific design, reasonable structure, reliable performance, wide application range, high stability, strong polarization resistance, and stable quality, and is used for pipeline transportation of va</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
recordid cdi_epo_espacenet_CN101857957A
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
title Cathodic protection monitoring probe, cathodic protection monitoring probe monitoring system, and manufacturing method and monitoring method thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-26T11%3A28%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LUO%20SHA&rft.date=2010-10-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN101857957A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true