Linear deposition source and method for producing deposition stream
A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of...
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| creator | CONROY CHAD DAHLSTROM JACOB A PRIDDY SCOTT WAYNE GOTTHOLD DAVID WILLIAM PATRIN JOHN BRESNAHAHN RICH |
| description | A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of conductance channels is coupled to an output of a respective one of the plurality of crucibles. A heater increases a temperature of the plurality of crucibles so that each crucible evaporates the deposition material into the plurality of conductance channels. An input of each of a plurality of nozzles is coupled to an output of one of the plurality of conductance channels. Evaporated deposition materials are transported from the crucibles through the conductance channels to the nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN101845612BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN101845612BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN101845612BB3</originalsourceid><addsrcrecordid>eNrjZHD2ycxLTSxSSEktyC_OLMnMz1Mozi8tSk5VSMxLUchNLcnIT1FIyy9SKCjKTylNzsxLR1FaUpSamMvDwJqWmFOcyguluRmU3FxDnD10gQrjU4sLEpNT81JL4p39DA0MLUxMzQyNnJyMiVIEABMEM2Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Linear deposition source and method for producing deposition stream</title><source>esp@cenet</source><creator>CONROY CHAD ; DAHLSTROM JACOB A ; PRIDDY SCOTT WAYNE ; GOTTHOLD DAVID WILLIAM ; PATRIN JOHN ; BRESNAHAHN RICH</creator><creatorcontrib>CONROY CHAD ; DAHLSTROM JACOB A ; PRIDDY SCOTT WAYNE ; GOTTHOLD DAVID WILLIAM ; PATRIN JOHN ; BRESNAHAHN RICH</creatorcontrib><description>A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of conductance channels is coupled to an output of a respective one of the plurality of crucibles. A heater increases a temperature of the plurality of crucibles so that each crucible evaporates the deposition material into the plurality of conductance channels. An input of each of a plurality of nozzles is coupled to an output of one of the plurality of conductance channels. Evaporated deposition materials are transported from the crucibles through the conductance channels to the nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120425&DB=EPODOC&CC=CN&NR=101845612B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120425&DB=EPODOC&CC=CN&NR=101845612B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CONROY CHAD</creatorcontrib><creatorcontrib>DAHLSTROM JACOB A</creatorcontrib><creatorcontrib>PRIDDY SCOTT WAYNE</creatorcontrib><creatorcontrib>GOTTHOLD DAVID WILLIAM</creatorcontrib><creatorcontrib>PATRIN JOHN</creatorcontrib><creatorcontrib>BRESNAHAHN RICH</creatorcontrib><title>Linear deposition source and method for producing deposition stream</title><description>A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of conductance channels is coupled to an output of a respective one of the plurality of crucibles. A heater increases a temperature of the plurality of crucibles so that each crucible evaporates the deposition material into the plurality of conductance channels. An input of each of a plurality of nozzles is coupled to an output of one of the plurality of conductance channels. Evaporated deposition materials are transported from the crucibles through the conductance channels to the nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD2ycxLTSxSSEktyC_OLMnMz1Mozi8tSk5VSMxLUchNLcnIT1FIyy9SKCjKTylNzsxLR1FaUpSamMvDwJqWmFOcyguluRmU3FxDnD10gQrjU4sLEpNT81JL4p39DA0MLUxMzQyNnJyMiVIEABMEM2Q</recordid><startdate>20120425</startdate><enddate>20120425</enddate><creator>CONROY CHAD</creator><creator>DAHLSTROM JACOB A</creator><creator>PRIDDY SCOTT WAYNE</creator><creator>GOTTHOLD DAVID WILLIAM</creator><creator>PATRIN JOHN</creator><creator>BRESNAHAHN RICH</creator><scope>EVB</scope></search><sort><creationdate>20120425</creationdate><title>Linear deposition source and method for producing deposition stream</title><author>CONROY CHAD ; DAHLSTROM JACOB A ; PRIDDY SCOTT WAYNE ; GOTTHOLD DAVID WILLIAM ; PATRIN JOHN ; BRESNAHAHN RICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101845612BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2012</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>CONROY CHAD</creatorcontrib><creatorcontrib>DAHLSTROM JACOB A</creatorcontrib><creatorcontrib>PRIDDY SCOTT WAYNE</creatorcontrib><creatorcontrib>GOTTHOLD DAVID WILLIAM</creatorcontrib><creatorcontrib>PATRIN JOHN</creatorcontrib><creatorcontrib>BRESNAHAHN RICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CONROY CHAD</au><au>DAHLSTROM JACOB A</au><au>PRIDDY SCOTT WAYNE</au><au>GOTTHOLD DAVID WILLIAM</au><au>PATRIN JOHN</au><au>BRESNAHAHN RICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Linear deposition source and method for producing deposition stream</title><date>2012-04-25</date><risdate>2012</risdate><abstract>A deposition source includes a plurality of crucibles that each contains a deposition material. A heat shield provides at least partial thermal isolation for at least one of the plurality of crucibles. A body is included with a plurality of conductance channels. An input of each of the plurality of conductance channels is coupled to an output of a respective one of the plurality of crucibles. A heater increases a temperature of the plurality of crucibles so that each crucible evaporates the deposition material into the plurality of conductance channels. An input of each of a plurality of nozzles is coupled to an output of one of the plurality of conductance channels. Evaporated deposition materials are transported from the crucibles through the conductance channels to the nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Linear deposition source and method for producing deposition stream |
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