Substrate holding apparatus and substrate processing method

The invention provides a retaining device of base plate and process method thereof for processing without vacuum adsorption base plates and process liquid dose not return to lower side of the base plates. The remaining device of base plate comprises: a bed plate (2) formed into a similar size with t...

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Bibliographische Detailangaben
Hauptverfasser:	MAKINO TSUTOMU, FUSE YOICHI, SACHINOBU NISHIBE, TAKAATSU RYOHEI, TAKAHIKO WAKAKAGE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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