A passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the man...

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Bibliographische Detailangaben

Hauptverfasser:	GILING ERWIN JOHANNES MARTINUS, KLAASSEN MICHEL FRANSOIS HUBER, VAN DE KERKHOF MARCUS ADRIANUS, KUIPER JOHANNES MARIA, ROOIJAKKERS WILHELMUS JACOBUS MARIA, SONNEVELD JACOB, VAN DOOREN LEON, WEHRENS MARTIJN GERARD DOMINIQ, UITTERDIJK TAMMO, KOK HAICO VICTOR, VAN GREEVENBROEK HENDRIKUS ROB, DE BOEIJ WILHELMUS PETRUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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