Method and system for dynamically controlling metrology work in progress

The present invention is generally directed to various methods and systems for dynamically controlling metrology work in progress. In one illustrative embodiment, the method comprises providing a metrology control unit (12) that is adapted to control metrology work flow to at least one metrology too...

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Bibliographische Detailangaben
Hauptverfasser: PURDY MATTHEW A, NICKSIC CABE W
Format: Patent
Sprache:chi ; eng
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