Apparatus and method for manufacturing photosensitive layer product
A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), and a joining mechanism (46). Firs...
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| creator | SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI |
| description | A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), and a joining mechanism (46). First and second detecting mechanisms (47a, 47b) for directly detecting boundary positions of photosensitive webs (22a, 22b) are disposed upstream of and closely to the joining mechanism (46). Based on detected information from the first and second detecting mechanisms (47a, 47b), relative positions of the boundary positions and a substrate (24) in a joining position and relative positions of the boundary positions themselves are adjusted. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN101014904A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN101014904A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN101014904A3</originalsourceid><addsrcrecordid>eNrjZHB2LChILEosKS1WSMxLUchNLcnIT1FIyy9SyE3MK01LTC4pLcrMS1coyMgvyS9OzSvOLMksS1XISaxMLVIoKMpPKU0u4WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgZAaGJpYOJoTIwaANc2MzQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and method for manufacturing photosensitive layer product</title><source>esp@cenet</source><creator>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</creator><creatorcontrib>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</creatorcontrib><description>A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), and a joining mechanism (46). First and second detecting mechanisms (47a, 47b) for directly detecting boundary positions of photosensitive webs (22a, 22b) are disposed upstream of and closely to the joining mechanism (46). Based on detected information from the first and second detecting mechanisms (47a, 47b), relative positions of the boundary positions and a substrate (24) in a joining position and relative positions of the boundary positions themselves are adjusted.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TRANSPORTING</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070808&DB=EPODOC&CC=CN&NR=101014904A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070808&DB=EPODOC&CC=CN&NR=101014904A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</creatorcontrib><title>Apparatus and method for manufacturing photosensitive layer product</title><description>A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), and a joining mechanism (46). First and second detecting mechanisms (47a, 47b) for directly detecting boundary positions of photosensitive webs (22a, 22b) are disposed upstream of and closely to the joining mechanism (46). Based on detected information from the first and second detecting mechanisms (47a, 47b), relative positions of the boundary positions and a substrate (24) in a joining position and relative positions of the boundary positions themselves are adjusted.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB2LChILEosKS1WSMxLUchNLcnIT1FIyy9SyE3MK01LTC4pLcrMS1coyMgvyS9OzSvOLMksS1XISaxMLVIoKMpPKU0u4WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgZAaGJpYOJoTIwaANc2MzQ</recordid><startdate>20070808</startdate><enddate>20070808</enddate><creator>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</creator><scope>EVB</scope></search><sort><creationdate>20070808</creationdate><title>Apparatus and method for manufacturing photosensitive layer product</title><author>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN101014904A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUEHARA KAZUYOSHI,AKIYOSHI HIROKAZU,IMOTO KENICHI,SUGIHARA RYOICHI,MORI AKIRA,SUZUKI TOMOAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and method for manufacturing photosensitive layer product</title><date>2007-08-08</date><risdate>2007</risdate><abstract>A manufacturing apparatus (20) has first and second reel-out mechanisms (32a, 32b), first and second processing mechanisms (36a, 36b), first and second reservoir mechanisms (42a, 42b), first and second peeling mechanisms (44a, 44b), a substrate feed mechanism (45), and a joining mechanism (46). First and second detecting mechanisms (47a, 47b) for directly detecting boundary positions of photosensitive webs (22a, 22b) are disposed upstream of and closely to the joining mechanism (46). Based on detected information from the first and second detecting mechanisms (47a, 47b), relative positions of the boundary positions and a substrate (24) in a joining position and relative positions of the boundary positions themselves are adjusted.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TRANSPORTING |
| title | Apparatus and method for manufacturing photosensitive layer product |
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