Verfahren zur Herstellung eines Dispergiermittels
The invention comprises compounds of the general formula wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH, -COO(CH2CH2O)CH2\CH2OH, -S(CH2CH2O)xCH2\CH...
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| creator | TOPHAM,ARTHUR LEWIS MOILLIET,JOHN |
| description | The invention comprises compounds of the general formula wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH, -COO(CH2CH2O)CH2\CH2OH, -S(CH2CH2O)xCH2\CH2OH, -NH(CH2CH2O)xCH2CH2OH, or-N[(CH2CH2O)xCH2CH2OH]2, x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.ALSO:The invention comprises compounds of the general formula wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH; -COO(CH2CH2O)xCH2CH2OH; -S(CH2CH2O)xCH2CH2OH; -NH(CH2CH2O)xCH2CH2OH; or -N[(CH2CH2O)xCH2CH2OH]2; x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or a naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueo |
| format | Patent |
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A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.ALSO:The invention comprises compounds of the general formula <FORM:1016829/C2/1> wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH; -COO(CH2CH2O)xCH2CH2OH; -S(CH2CH2O)xCH2CH2OH; -NH(CH2CH2O)xCH2CH2OH; or -N[(CH2CH2O)xCH2CH2OH]2; x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or a naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.</description><edition>1</edition><language>ger</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ADHESIVES ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS BASED THEREON ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; DYES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1967</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19670430&DB=EPODOC&CC=CH&NR=434223A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19670430&DB=EPODOC&CC=CH&NR=434223A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TOPHAM,ARTHUR</creatorcontrib><creatorcontrib>LEWIS MOILLIET,JOHN</creatorcontrib><title>Verfahren zur Herstellung eines Dispergiermittels</title><description>The invention comprises compounds of the general formula <FORM:1016829/C3/1> wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH, -COO(CH2CH2O)CH2\CH2OH, -S(CH2CH2O)xCH2\CH2OH, -NH(CH2CH2O)xCH2CH2OH, or-N[(CH2CH2O)xCH2CH2OH]2, x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.ALSO:The invention comprises compounds of the general formula <FORM:1016829/C2/1> wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH; -COO(CH2CH2O)xCH2CH2OH; -S(CH2CH2O)xCH2CH2OH; -NH(CH2CH2O)xCH2CH2OH; or -N[(CH2CH2O)xCH2CH2OH]2; x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or a naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>ADHESIVES</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>DYES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1967</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAMSy1KS8woSs1TqCotUvBILSouSc3JKc1LV0jNzEstVnDJLC5ILUrPTC3KzSwBShXzMLCmJeYUp_JCaW4GOTfXEGcP3dSC_PjU4oLE5NS81JJ4Zw8TYxMjI2NHY4IKANR6Kv0</recordid><startdate>19670430</startdate><enddate>19670430</enddate><creator>TOPHAM,ARTHUR</creator><creator>LEWIS MOILLIET,JOHN</creator><scope>EVB</scope></search><sort><creationdate>19670430</creationdate><title>Verfahren zur Herstellung eines Dispergiermittels</title><author>TOPHAM,ARTHUR ; LEWIS MOILLIET,JOHN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CH434223A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1967</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>ADHESIVES</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>DYES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>TOPHAM,ARTHUR</creatorcontrib><creatorcontrib>LEWIS MOILLIET,JOHN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TOPHAM,ARTHUR</au><au>LEWIS MOILLIET,JOHN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Verfahren zur Herstellung eines Dispergiermittels</title><date>1967-04-30</date><risdate>1967</risdate><abstract>The invention comprises compounds of the general formula <FORM:1016829/C3/1> wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH, -COO(CH2CH2O)CH2\CH2OH, -S(CH2CH2O)xCH2\CH2OH, -NH(CH2CH2O)xCH2CH2OH, or-N[(CH2CH2O)xCH2CH2OH]2, x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.ALSO:The invention comprises compounds of the general formula <FORM:1016829/C2/1> wherein A represents a trivalent polynuclear radical containing at least 2 fused aromatic rings optionally substituted by chlorine but unsubstituted by alkyl groups, X represents O(CH2CH2O)xCH2CH2OH; -COO(CH2CH2O)xCH2CH2OH; -S(CH2CH2O)xCH2CH2OH; -NH(CH2CH2O)xCH2CH2OH; or -N[(CH2CH2O)xCH2CH2OH]2; x being an integer from 1 to 100 and preferably from 4 to 20, n is zero or a number greater than zero, R represents hydrogen or a monovalent hydrocarbon radical containing up to 6 carbon atoms. A is preferably a naphthalene nucleus but may be an anthracene or other polynuclear aromatic nucleus. The novel compounds may be made by reacting a substituted polynuclear aromatic compound bearing as a substituent a polyethenoxy chain represented by X with an aldehyde, preferably formaldehyde or paraform. Thus a naphthol or a naphthalene compound containing a carboxyl group, a thiol group, or an amino group may be reacted with ethylene oxide and thereafter with an aldehyde such as formaldehyde. The condensation with the aldehyde is preferably effected in the presence of a strong mineral acid such as sulphuric acid, if desired in aqueous medium, and preferably at a temperature between 60 DEG C. and 150 DEG C.</abstract><edition>1</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON DIFFUSION TREATMENT OF METALLIC MATERIAL DYES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Verfahren zur Herstellung eines Dispergiermittels |
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