Verfahren zur Darstellung von Oniumfluoriden
Onium fluorides (fluorides of substituted ammonium, phosphonium, arsonium and stibonium ions) are prepared by (i) reacting an onium chloride, bromide or iodide with HF under anhydrous conditions to form an onium fluoride/hydrogen fluoride addition compound, reacting this with a metal alkoxide to pro...
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description | Onium fluorides (fluorides of substituted ammonium, phosphonium, arsonium and stibonium ions) are prepared by (i) reacting an onium chloride, bromide or iodide with HF under anhydrous conditions to form an onium fluoride/hydrogen fluoride addition compound, reacting this with a metal alkoxide to produce the corresponding alcohol addition compound, and thermally degrading the latter; or (ii) reacting an onium chloride, bromide or iodide with a metal alkoxide, reacting the product with HF under anhydrous conditions to form an onium fluoride/alcohol addition compound, and thermally degrading the latter. Examples prepare [CH3)4N]F, 1-benzylpyridinium fluoride, [(CH3)4Sb]F, trimethylbenzylammonium fluoride, [(C2H5)4N]F, [(CH3)3(C2H5)N]F, C3\H7)4N]F, [(n-C3H7)4N]F, trimethylcetylammonium fluoride, cetylpyridinium fluoride, [(CH3)3(C6H5)N]F [(C6H5)4P]F, [(C6H5)4As]F and [CH3(C6H5)3-As]F. The fluorides may be thermally cracked to give alkyl or aryl fluorides, e.g. benzyl fluoride from trimethylbenzylammonium fluoride, and methyl fluoride from [(CH3)4N]F. The onium fluorides are good conductors and may be used in condensers (see Division Hl) or electrolytic processes (see Division C7). They also react with metal alkyls to produce organometallic complex salts.ALSO:Solvate free substituted ammonium, phosphonium, arsonium or stibonium fluorides (see Division C2) can be reacted with metal alkyls to form organometallic complex salts for use as molten electrolytes, e.g. for refining aluminium or they can be used for the anodic production of fluoride layers on metal surfaces. |
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Examples prepare [CH3)4N]F, 1-benzylpyridinium fluoride, [(CH3)4Sb]F, trimethylbenzylammonium fluoride, [(C2H5)4N]F, [(CH3)3(C2H5)N]F, C3\H7)4N]F, [(n-C3H7)4N]F, trimethylcetylammonium fluoride, cetylpyridinium fluoride, [(CH3)3(C6H5)N]F [(C6H5)4P]F, [(C6H5)4As]F and [CH3(C6H5)3-As]F. The fluorides may be thermally cracked to give alkyl or aryl fluorides, e.g. benzyl fluoride from trimethylbenzylammonium fluoride, and methyl fluoride from [(CH3)4N]F. The onium fluorides are good conductors and may be used in condensers (see Division Hl) or electrolytic processes (see Division C7). They also react with metal alkyls to produce organometallic complex salts.ALSO:Solvate free substituted ammonium, phosphonium, arsonium or stibonium fluorides (see Division C2) can be reacted with metal alkyls to form organometallic complex salts for use as molten electrolytes, e.g. for refining aluminium or they can be used for the anodic production of fluoride layers on metal surfaces.</description><edition>1</edition><language>ger</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; BASIC ELECTRIC ELEMENTS ; CAPACITORS ; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE ; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; GLASS ; HETEROCYCLIC COMPOUNDS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; ORGANIC CHEMISTRY ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS</subject><creationdate>1967</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19670331&DB=EPODOC&CC=CH&NR=432517A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19670331&DB=EPODOC&CC=CH&NR=432517A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>URBAN,GERD</creatorcontrib><creatorcontrib>DOETZER,RICHARD,DR</creatorcontrib><title>Verfahren zur Darstellung von Oniumfluoriden</title><description>Onium fluorides (fluorides of substituted ammonium, phosphonium, arsonium and stibonium ions) are prepared by (i) reacting an onium chloride, bromide or iodide with HF under anhydrous conditions to form an onium fluoride/hydrogen fluoride addition compound, reacting this with a metal alkoxide to produce the corresponding alcohol addition compound, and thermally degrading the latter; or (ii) reacting an onium chloride, bromide or iodide with a metal alkoxide, reacting the product with HF under anhydrous conditions to form an onium fluoride/alcohol addition compound, and thermally degrading the latter. Examples prepare [CH3)4N]F, 1-benzylpyridinium fluoride, [(CH3)4Sb]F, trimethylbenzylammonium fluoride, [(C2H5)4N]F, [(CH3)3(C2H5)N]F, C3\H7)4N]F, [(n-C3H7)4N]F, trimethylcetylammonium fluoride, cetylpyridinium fluoride, [(CH3)3(C6H5)N]F [(C6H5)4P]F, [(C6H5)4As]F and [CH3(C6H5)3-As]F. The fluorides may be thermally cracked to give alkyl or aryl fluorides, e.g. benzyl fluoride from trimethylbenzylammonium fluoride, and methyl fluoride from [(CH3)4N]F. The onium fluorides are good conductors and may be used in condensers (see Division Hl) or electrolytic processes (see Division C7). They also react with metal alkyls to produce organometallic complex salts.ALSO:Solvate free substituted ammonium, phosphonium, arsonium or stibonium fluorides (see Division C2) can be reacted with metal alkyls to form organometallic complex salts for use as molten electrolytes, e.g. for refining aluminium or they can be used for the anodic production of fluoride layers on metal surfaces.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CAPACITORS</subject><subject>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</subject><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>GLASS</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>ORGANIC CHEMISTRY</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1967</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAJSy1KS8woSs1TqCotUnBJLCouSc3JKc1LVyjLz1Pwz8sszU3LKc0vykxJzeNhYE1LzClO5YXS3Axybq4hzh66qQX58anFBYnJqXmpJfHOHibGRqaG5o7GBBUAAM-eKPc</recordid><startdate>19670331</startdate><enddate>19670331</enddate><creator>URBAN,GERD</creator><creator>DOETZER,RICHARD,DR</creator><scope>EVB</scope></search><sort><creationdate>19670331</creationdate><title>Verfahren zur Darstellung von Oniumfluoriden</title><author>URBAN,GERD ; DOETZER,RICHARD,DR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CH432517A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1967</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CAPACITORS</topic><topic>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>GLASS</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>ORGANIC CHEMISTRY</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><toplevel>online_resources</toplevel><creatorcontrib>URBAN,GERD</creatorcontrib><creatorcontrib>DOETZER,RICHARD,DR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>URBAN,GERD</au><au>DOETZER,RICHARD,DR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Verfahren zur Darstellung von Oniumfluoriden</title><date>1967-03-31</date><risdate>1967</risdate><abstract>Onium fluorides (fluorides of substituted ammonium, phosphonium, arsonium and stibonium ions) are prepared by (i) reacting an onium chloride, bromide or iodide with HF under anhydrous conditions to form an onium fluoride/hydrogen fluoride addition compound, reacting this with a metal alkoxide to produce the corresponding alcohol addition compound, and thermally degrading the latter; or (ii) reacting an onium chloride, bromide or iodide with a metal alkoxide, reacting the product with HF under anhydrous conditions to form an onium fluoride/alcohol addition compound, and thermally degrading the latter. Examples prepare [CH3)4N]F, 1-benzylpyridinium fluoride, [(CH3)4Sb]F, trimethylbenzylammonium fluoride, [(C2H5)4N]F, [(CH3)3(C2H5)N]F, C3\H7)4N]F, [(n-C3H7)4N]F, trimethylcetylammonium fluoride, cetylpyridinium fluoride, [(CH3)3(C6H5)N]F [(C6H5)4P]F, [(C6H5)4As]F and [CH3(C6H5)3-As]F. The fluorides may be thermally cracked to give alkyl or aryl fluorides, e.g. benzyl fluoride from trimethylbenzylammonium fluoride, and methyl fluoride from [(CH3)4N]F. The onium fluorides are good conductors and may be used in condensers (see Division Hl) or electrolytic processes (see Division C7). They also react with metal alkyls to produce organometallic complex salts.ALSO:Solvate free substituted ammonium, phosphonium, arsonium or stibonium fluorides (see Division C2) can be reacted with metal alkyls to form organometallic complex salts for use as molten electrolytes, e.g. for refining aluminium or they can be used for the anodic production of fluoride layers on metal surfaces.</abstract><edition>1</edition><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CAPACITORS CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY GLASS HETEROCYCLIC COMPOUNDS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ORGANIC CHEMISTRY SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
title | Verfahren zur Darstellung von Oniumfluoriden |
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