METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATE
The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising the steps (A) to (C), wherein step (C) is an etching step including a contacting with an etching composition. The etching composition comprises permanganate ions and phosphoric ac...
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| creator | SZAMOCKI, RAFAEL-EDUARD FELS, CARL CHRISTIAN FINN, FRANZISKA |
| description | The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising the steps (A) to (C), wherein step (C) is an etching step including a contacting with an etching composition. The etching composition comprises permanganate ions and phosphoric acid, each in specifically defined concentration ranges.
La présente invention concerne un procédé de gravure d'au moins une surface d'un substrat en plastique, le procédé comprenant les étapes (A) à (C), l'étape (C) étant une étape de gravure comprenant une mise en contact avec une composition de gravure. La composition de gravure comprend des ions de permanganate et de l'acide phosphorique, chacun dans des plages de concentration spécifiquement définies. |
| format | Patent |
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La présente invention concerne un procédé de gravure d'au moins une surface d'un substrat en plastique, le procédé comprenant les étapes (A) à (C), l'étape (C) étant une étape de gravure comprenant une mise en contact avec une composition de gravure. La composition de gravure comprend des ions de permanganate et de l'acide phosphorique, chacun dans des plages de concentration spécifiquement définies.</description><language>eng ; fre</language><subject>APPARATUS THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220623&DB=EPODOC&CC=CA&NR=3202609A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220623&DB=EPODOC&CC=CA&NR=3202609A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SZAMOCKI, RAFAEL-EDUARD</creatorcontrib><creatorcontrib>FELS, CARL CHRISTIAN</creatorcontrib><creatorcontrib>FINN, FRANZISKA</creatorcontrib><title>METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATE</title><description>The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising the steps (A) to (C), wherein step (C) is an etching step including a contacting with an etching composition. The etching composition comprises permanganate ions and phosphoric acid, each in specifically defined concentration ranges.
La présente invention concerne un procédé de gravure d'au moins une surface d'un substrat en plastique, le procédé comprenant les étapes (A) à (C), l'étape (C) étant une étape de gravure comprenant une mise en contact avec une composition de gravure. La composition de gravure comprend des ions de permanganate et de l'acide phosphorique, chacun dans des plages de concentration spécifiquement définies.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDzdQ3x8HdRcPMPUnANcfbw9HNXcAxR8HF1DA5R8PdzVQgODXJzdHZV8HdTcFQI8AEKezoDBZ2CQ4IcQ1x5GFjTEnOKU3mhNDeDghvIGN3Ugvz41OKCxOTUvNSSeGdHYyMDIzMDS0dDYyKUAADL_Ckd</recordid><startdate>20220623</startdate><enddate>20220623</enddate><creator>SZAMOCKI, RAFAEL-EDUARD</creator><creator>FELS, CARL CHRISTIAN</creator><creator>FINN, FRANZISKA</creator><scope>EVB</scope></search><sort><creationdate>20220623</creationdate><title>METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATE</title><author>SZAMOCKI, RAFAEL-EDUARD ; FELS, CARL CHRISTIAN ; FINN, FRANZISKA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CA3202609A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2022</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SZAMOCKI, RAFAEL-EDUARD</creatorcontrib><creatorcontrib>FELS, CARL CHRISTIAN</creatorcontrib><creatorcontrib>FINN, FRANZISKA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SZAMOCKI, RAFAEL-EDUARD</au><au>FELS, CARL CHRISTIAN</au><au>FINN, FRANZISKA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATE</title><date>2022-06-23</date><risdate>2022</risdate><abstract>The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising the steps (A) to (C), wherein step (C) is an etching step including a contacting with an etching composition. The etching composition comprises permanganate ions and phosphoric acid, each in specifically defined concentration ranges.
La présente invention concerne un procédé de gravure d'au moins une surface d'un substrat en plastique, le procédé comprenant les étapes (A) à (C), l'étape (C) étant une étape de gravure comprenant une mise en contact avec une composition de gravure. La composition de gravure comprend des ions de permanganate et de l'acide phosphorique, chacun dans des plages de concentration spécifiquement définies.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | METHOD FOR ETCHING AT LEAST ONE SURFACE OF A PLASTIC SUBSTRATE |
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