POWDER COATING METHOD

The present invention relates to a plasma coating method for coating particulate matter, comprising the steps of: a) providing a low-temperature atmospheric plasma jet from a plasma gas outside of the reaction chamber; b) inserting a precursor into the plasma jet, thereby obtaining a plasma coating...

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Hauptverfasser:	HEYBERGER, REGIS, JACOBS, MARC, SCHELTJENS, GILL, VAN DER GUCHT, FILIP, PESCOD, RUSSEL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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creator	HEYBERGER, REGIS JACOBS, MARC SCHELTJENS, GILL VAN DER GUCHT, FILIP PESCOD, RUSSEL
description	The present invention relates to a plasma coating method for coating particulate matter, comprising the steps of: a) providing a low-temperature atmospheric plasma jet from a plasma gas outside of the reaction chamber; b) inserting a precursor into the plasma jet, thereby obtaining a plasma coating flow comprising an excited precursor, followed by injecting the plasma coating flow comprising the excited precursor in the reaction chamber, and c) subjecting particulate matter to said plasma coating flow comprising said excited precursor, thereby obtaining particulate matter comprising an at least partial coating. The present invention also relates to a coating reactor apparatus and a system. La présente invention porte sur un procédé d'enrobage par plasma pour appliquer un enrobage à une matière particulaire, comprenant les étapes consistant à : a) fournir un jet de plasma atmosphérique à basse température émanant d'un gaz plasma à l'extérieur de la chambre de réaction ; b) insérer un précurseur dans le jet de plasma, ce qui permet d'obtenir un flux d'enrobage par projection de plasma comprenant un précurseur excité, suivi par l'injection du flux d'enrobage par projection de plasma comprenant le précurseur excité dans la chambre de réaction, et c) soumettre la matière particulaire au flux d'enrobage par projection de plasma comprenant ledit précurseur excité, ce qui permet d'obtenir une matière particulaire comprenant un enrobage au moins partiel. La présente invention concerne également un appareil de réacteur d'enrobage et un système.
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The present invention also relates to a coating reactor apparatus and a system. La présente invention porte sur un procédé d'enrobage par plasma pour appliquer un enrobage à une matière particulaire, comprenant les étapes consistant à : a) fournir un jet de plasma atmosphérique à basse température émanant d'un gaz plasma à l'extérieur de la chambre de réaction ; b) insérer un précurseur dans le jet de plasma, ce qui permet d'obtenir un flux d'enrobage par projection de plasma comprenant un précurseur excité, suivi par l'injection du flux d'enrobage par projection de plasma comprenant le précurseur excité dans la chambre de réaction, et c) soumettre la matière particulaire au flux d'enrobage par projection de plasma comprenant ledit précurseur excité, ce qui permet d'obtenir une matière particulaire comprenant un enrobage au moins partiel. La présente invention concerne également un appareil de réacteur d'enrobage et un système.</description><language>eng ; fre</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PLASMA TECHNIQUE ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SPRAYING OR ATOMISING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220505&DB=EPODOC&CC=CA&NR=3200283A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220505&DB=EPODOC&CC=CA&NR=3200283A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HEYBERGER, REGIS</creatorcontrib><creatorcontrib>JACOBS, MARC</creatorcontrib><creatorcontrib>SCHELTJENS, GILL</creatorcontrib><creatorcontrib>VAN DER GUCHT, FILIP</creatorcontrib><creatorcontrib>PESCOD, RUSSEL</creatorcontrib><title>POWDER COATING METHOD</title><description>The present invention relates to a plasma coating method for coating particulate matter, comprising the steps of: a) providing a low-temperature atmospheric plasma jet from a plasma gas outside of the reaction chamber; b) inserting a precursor into the plasma jet, thereby obtaining a plasma coating flow comprising an excited precursor, followed by injecting the plasma coating flow comprising the excited precursor in the reaction chamber, and c) subjecting particulate matter to said plasma coating flow comprising said excited precursor, thereby obtaining particulate matter comprising an at least partial coating. The present invention also relates to a coating reactor apparatus and a system. La présente invention porte sur un procédé d'enrobage par plasma pour appliquer un enrobage à une matière particulaire, comprenant les étapes consistant à : a) fournir un jet de plasma atmosphérique à basse température émanant d'un gaz plasma à l'extérieur de la chambre de réaction ; b) insérer un précurseur dans le jet de plasma, ce qui permet d'obtenir un flux d'enrobage par projection de plasma comprenant un précurseur excité, suivi par l'injection du flux d'enrobage par projection de plasma comprenant le précurseur excité dans la chambre de réaction, et c) soumettre la matière particulaire au flux d'enrobage par projection de plasma comprenant ledit précurseur excité, ce qui permet d'obtenir une matière particulaire comprenant un enrobage au moins partiel. La présente invention concerne également un appareil de réacteur d'enrobage et un système.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PLASMA TECHNIQUE</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAN8A93cQ1ScPZ3DPH0c1fwdQ3x8HfhYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxzo7GRgYGRhbGjobGRCgBAFQbHj0</recordid><startdate>20220505</startdate><enddate>20220505</enddate><creator>HEYBERGER, REGIS</creator><creator>JACOBS, MARC</creator><creator>SCHELTJENS, GILL</creator><creator>VAN DER GUCHT, FILIP</creator><creator>PESCOD, RUSSEL</creator><scope>EVB</scope></search><sort><creationdate>20220505</creationdate><title>POWDER COATING METHOD</title><author>HEYBERGER, REGIS ; JACOBS, MARC ; SCHELTJENS, GILL ; VAN DER GUCHT, FILIP ; PESCOD, RUSSEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CA3200283A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2022</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PLASMA TECHNIQUE</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HEYBERGER, REGIS</creatorcontrib><creatorcontrib>JACOBS, MARC</creatorcontrib><creatorcontrib>SCHELTJENS, GILL</creatorcontrib><creatorcontrib>VAN DER GUCHT, FILIP</creatorcontrib><creatorcontrib>PESCOD, RUSSEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HEYBERGER, REGIS</au><au>JACOBS, MARC</au><au>SCHELTJENS, GILL</au><au>VAN DER GUCHT, FILIP</au><au>PESCOD, RUSSEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POWDER COATING METHOD</title><date>2022-05-05</date><risdate>2022</risdate><abstract>The present invention relates to a plasma coating method for coating particulate matter, comprising the steps of: a) providing a low-temperature atmospheric plasma jet from a plasma gas outside of the reaction chamber; b) inserting a precursor into the plasma jet, thereby obtaining a plasma coating flow comprising an excited precursor, followed by injecting the plasma coating flow comprising the excited precursor in the reaction chamber, and c) subjecting particulate matter to said plasma coating flow comprising said excited precursor, thereby obtaining particulate matter comprising an at least partial coating. The present invention also relates to a coating reactor apparatus and a system. La présente invention porte sur un procédé d'enrobage par plasma pour appliquer un enrobage à une matière particulaire, comprenant les étapes consistant à : a) fournir un jet de plasma atmosphérique à basse température émanant d'un gaz plasma à l'extérieur de la chambre de réaction ; b) insérer un précurseur dans le jet de plasma, ce qui permet d'obtenir un flux d'enrobage par projection de plasma comprenant un précurseur excité, suivi par l'injection du flux d'enrobage par projection de plasma comprenant le précurseur excité dans la chambre de réaction, et c) soumettre la matière particulaire au flux d'enrobage par projection de plasma comprenant ledit précurseur excité, ce qui permet d'obtenir une matière particulaire comprenant un enrobage au moins partiel. La présente invention concerne également un appareil de réacteur d'enrobage et un système.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
title	POWDER COATING METHOD
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