AMINO-SILOXANE COMPOSITION AND METHODS OF USING THE SAME
An amino-siloxane composition is presented. The amino-siloxane composition includes structure (I): wherein R' is independently at each occurrence a C1-05 aliphatic radical; R2 is a C3-C4 aliphatic radical; R3 is a C1-05 aliphatic radical or R4, wherein R4 comprises structure (II): and X is an e...
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| creator | FARNUM, RACHEL LIZABETH PERRY, ROBERT JAMES O'BRIEN, MICHAEL JOSEPH |
| description | An amino-siloxane composition is presented. The amino-siloxane composition includes structure (I): wherein R' is independently at each occurrence a C1-05 aliphatic radical; R2 is a C3-C4 aliphatic radical; R3 is a C1-05 aliphatic radical or R4, wherein R4 comprises structure (II): and X is an electron donating group. Methods of reducing an amount of carbon dioxide in a process stream using the amino-siloxane composition are also presented.
Une composition daminosiloxane est décrite. La composition daminosiloxane comprend la structure (I) où R' représente indépendamment à chaque occurrence un radical aliphatique en C1 à C5; R2 est un radical aliphatique en C3 à C4; R3 est un radical aliphatique en C1 à C5 ou R4, où R4 comprend la structure (II) et X est un groupe donneur délectrons. Il est également décrit des méthodes de réduction de la quantité de dioxyde de carbone dans un courant de traitement employant les compositions daminosiloxane. |
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Une composition daminosiloxane est décrite. La composition daminosiloxane comprend la structure (I) où R' représente indépendamment à chaque occurrence un radical aliphatique en C1 à C5; R2 est un radical aliphatique en C3 à C4; R3 est un radical aliphatique en C1 à C5 ou R4, où R4 comprend la structure (II) et X est un groupe donneur délectrons. Il est également décrit des méthodes de réduction de la quantité de dioxyde de carbone dans un courant de traitement employant les compositions daminosiloxane.</description><language>eng ; fre</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; ADHESIVES ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; PAINTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; POLISHES ; SEPARATION ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231128&DB=EPODOC&CC=CA&NR=3144131C$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231128&DB=EPODOC&CC=CA&NR=3144131C$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FARNUM, RACHEL LIZABETH</creatorcontrib><creatorcontrib>PERRY, ROBERT JAMES</creatorcontrib><creatorcontrib>O'BRIEN, MICHAEL JOSEPH</creatorcontrib><title>AMINO-SILOXANE COMPOSITION AND METHODS OF USING THE SAME</title><description>An amino-siloxane composition is presented. The amino-siloxane composition includes structure (I): wherein R' is independently at each occurrence a C1-05 aliphatic radical; R2 is a C3-C4 aliphatic radical; R3 is a C1-05 aliphatic radical or R4, wherein R4 comprises structure (II): and X is an electron donating group. Methods of reducing an amount of carbon dioxide in a process stream using the amino-siloxane composition are also presented.
Une composition daminosiloxane est décrite. La composition daminosiloxane comprend la structure (I) où R' représente indépendamment à chaque occurrence un radical aliphatique en C1 à C5; R2 est un radical aliphatique en C3 à C4; R3 est un radical aliphatique en C1 à C5 ou R4, où R4 comprend la structure (II) et X est un groupe donneur délectrons. Il est également décrit des méthodes de réduction de la quantité de dioxyde de carbone dans un courant de traitement employant les compositions daminosiloxane.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>POLISHES</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBw9PX089cN9vTxj3D0c1Vw9vcN8A_2DPH091Nw9HNR8HUN8fB3CVbwd1MIDfb0c1cI8XBVCHb0deVhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHOjsaGJiaGxobOxoRVAADC-ydo</recordid><startdate>20231128</startdate><enddate>20231128</enddate><creator>FARNUM, RACHEL LIZABETH</creator><creator>PERRY, ROBERT JAMES</creator><creator>O'BRIEN, MICHAEL JOSEPH</creator><scope>EVB</scope></search><sort><creationdate>20231128</creationdate><title>AMINO-SILOXANE COMPOSITION AND METHODS OF USING THE SAME</title><author>FARNUM, RACHEL LIZABETH ; PERRY, ROBERT JAMES ; O'BRIEN, MICHAEL JOSEPH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CA3144131C3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre</language><creationdate>2023</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>POLISHES</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>FARNUM, RACHEL LIZABETH</creatorcontrib><creatorcontrib>PERRY, ROBERT JAMES</creatorcontrib><creatorcontrib>O'BRIEN, MICHAEL JOSEPH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FARNUM, RACHEL LIZABETH</au><au>PERRY, ROBERT JAMES</au><au>O'BRIEN, MICHAEL JOSEPH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>AMINO-SILOXANE COMPOSITION AND METHODS OF USING THE SAME</title><date>2023-11-28</date><risdate>2023</risdate><abstract>An amino-siloxane composition is presented. The amino-siloxane composition includes structure (I): wherein R' is independently at each occurrence a C1-05 aliphatic radical; R2 is a C3-C4 aliphatic radical; R3 is a C1-05 aliphatic radical or R4, wherein R4 comprises structure (II): and X is an electron donating group. Methods of reducing an amount of carbon dioxide in a process stream using the amino-siloxane composition are also presented.
Une composition daminosiloxane est décrite. La composition daminosiloxane comprend la structure (I) où R' représente indépendamment à chaque occurrence un radical aliphatique en C1 à C5; R2 est un radical aliphatique en C3 à C4; R3 est un radical aliphatique en C1 à C5 ou R4, où R4 comprend la structure (II) et X est un groupe donneur délectrons. Il est également décrit des méthodes de réduction de la quantité de dioxyde de carbone dans un courant de traitement employant les compositions daminosiloxane.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POLISHES SEPARATION TRANSPORTING |
| title | AMINO-SILOXANE COMPOSITION AND METHODS OF USING THE SAME |
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