BIPOLAR PLATE WITH FORCE CONCENTRATOR PATTERN

Embodiments of present disclosure are directed to a bipolar plate assembly. The bipolar plate assembly has a frame and a base. At least one of the frame and the base has a shape of a force concentrator pattern or has a first surface having a force concentrator pattern, the force concentrator pattern...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	VAN BOEYEN, ROGER
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
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