DRY MULTILAYER INORGANIC ALLOY THERMAL RESIST FILM FOR LITHOGRAPHIC PROCESSING AND IMAGE CREATION

A thermal inorganic resist useful for lithographic processes and image creation is created by depositing on a substrate at least two layers of materials which are typically metals. The materials form a mixed alloy with a eutectic. One embodiment has a 15 nm Bi layer overlying a 15 nm In layer. Up on...

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Bibliographische Detailangaben

Hauptverfasser:	TU, YUGIANG, CHAPMAN, GLENN HARRISON, SARUNIC, MARINKO VENCI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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