AMORPHOUS FLUOROPOLYMER PELLICLE FILMS

A pellicle comprising a thin, durable film of substantially uniform thickness which absorbs less than 10% light at wavelengths between 190 and 820 nanometers, tautly adhered to one edge of an enclosed support frame, said thin film comprising amorphous fluoropolymers having a refractive index between...

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Bibliographische Detailangaben
1. Verfasser:	KEYS, DALEN E
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	A pellicle comprising a thin, durable film of substantially uniform thickness which absorbs less than 10% light at wavelengths between 190 and 820 nanometers, tautly adhered to one edge of an enclosed support frame, said thin film comprising amorphous fluoropolymers having a refractive index between 1.24 and 1.41. Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.