DESENSITISED QUINONE DIAZIDE COMPOUNDS
K-17323/=/MER 20 Desensitized quinone diazide compounds The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain microcrystalline cellulose as desensitising agent.
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| creator | DRESELY, STEFAN RAULIN, DITMAR |
| description | K-17323/=/MER 20 Desensitized quinone diazide compounds The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain microcrystalline cellulose as desensitising agent. |
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fre</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1990</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900427&DB=EPODOC&CC=CA&NR=2001492A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900427&DB=EPODOC&CC=CA&NR=2001492A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DRESELY, STEFAN</creatorcontrib><creatorcontrib>RAULIN, DITMAR</creatorcontrib><title>DESENSITISED QUINONE DIAZIDE COMPOUNDS</title><description>K-17323/=/MER 20 Desensitized quinone diazide compounds The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain microcrystalline cellulose as desensitising agent.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1990</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBzcQ129Qv2DPEMdnVRCAz19PP3c1Vw8XSM8nRxVXD29w3wD_VzCeZhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfHOjkYGBoYmlkaOhsZEKAEAkTwjLA</recordid><startdate>19900427</startdate><enddate>19900427</enddate><creator>DRESELY, STEFAN</creator><creator>RAULIN, DITMAR</creator><scope>EVB</scope></search><sort><creationdate>19900427</creationdate><title>DESENSITISED QUINONE DIAZIDE COMPOUNDS</title><author>DRESELY, STEFAN ; 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| language | eng ; fre |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | DESENSITISED QUINONE DIAZIDE COMPOUNDS |
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