TRENCH TRANSISTOR

TRENCH TRANSISTOR The specification describes a new MOS transistor structure in which the source gate and drain are formed within a trench in the semiconductor substrate. The gate width is determined by the depth of the trench and can be increased substantially without increasing the surface area oc...

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Bibliographische Detailangaben
1. Verfasser: LANCASTER, LOREN T
Format: Patent
Sprache:eng ; fre
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