PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD
On a photographic element comprising at least one heat-processable, photographic layer, a protective layer comprising certain carboxylic polyesters provides improved resistance to abrasion and fingerprinting, resistance to reticulation and surface cracking without adversely affecting sensitometric p...
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creator | HAMB, FREDRICK L HILLER, GARY L WISE, ALBERT W |
description | On a photographic element comprising at least one heat-processable, photographic layer, a protective layer comprising certain carboxylic polyesters provides improved resistance to abrasion and fingerprinting, resistance to reticulation and surface cracking without adversely affecting sensitometric properties of the photographic element upon processing. A latent image in such a photographic element can be developed by uniformly heating the photothermographic element containing the protective layer. Silica particles in the protective layer can enhance resistance of the protective layer to sticking to a heated metal surface and further enable the layer to glide smoothly over the heated metal surface. |
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A latent image in such a photographic element can be developed by uniformly heating the photothermographic element containing the protective layer. Silica particles in the protective layer can enhance resistance of the protective layer to sticking to a heated metal surface and further enable the layer to glide smoothly over the heated metal surface.</description><language>eng</language><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>1978</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19780523&DB=EPODOC&CC=CA&NR=1031616A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19780523&DB=EPODOC&CC=CA&NR=1031616A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAMB, FREDRICK L</creatorcontrib><creatorcontrib>HILLER, GARY L</creatorcontrib><creatorcontrib>WISE, ALBERT W</creatorcontrib><title>PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD</title><description>On a photographic element comprising at least one heat-processable, photographic layer, a protective layer comprising certain carboxylic polyesters provides improved resistance to abrasion and fingerprinting, resistance to reticulation and surface cracking without adversely affecting sensitometric properties of the photographic element upon processing. A latent image in such a photographic element can be developed by uniformly heating the photothermographic element containing the protective layer. Silica particles in the protective layer can enhance resistance of the protective layer to sticking to a heated metal surface and further enable the layer to glide smoothly over the heated metal surface.</description><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1978</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAPCPIPcXUO8QxzVfBxjHQNUnDzD1II8PAP8Q929Qv2BEu4-rj6uvqFBCs4-rko-LqGePi78DCwpiXmFKfyQmluBnk31xBnD93Ugvz41OKCxOTUvNSSeGdHQwNjQzNDM0djwioAxKkngg</recordid><startdate>19780523</startdate><enddate>19780523</enddate><creator>HAMB, FREDRICK L</creator><creator>HILLER, GARY L</creator><creator>WISE, ALBERT W</creator><scope>EVB</scope></search><sort><creationdate>19780523</creationdate><title>PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD</title><author>HAMB, FREDRICK L ; HILLER, GARY L ; WISE, ALBERT W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CA1031616A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1978</creationdate><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HAMB, FREDRICK L</creatorcontrib><creatorcontrib>HILLER, GARY L</creatorcontrib><creatorcontrib>WISE, ALBERT W</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAMB, FREDRICK L</au><au>HILLER, GARY L</au><au>WISE, ALBERT W</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD</title><date>1978-05-23</date><risdate>1978</risdate><abstract>On a photographic element comprising at least one heat-processable, photographic layer, a protective layer comprising certain carboxylic polyesters provides improved resistance to abrasion and fingerprinting, resistance to reticulation and surface cracking without adversely affecting sensitometric properties of the photographic element upon processing. A latent image in such a photographic element can be developed by uniformly heating the photothermographic element containing the protective layer. Silica particles in the protective layer can enhance resistance of the protective layer to sticking to a heated metal surface and further enable the layer to glide smoothly over the heated metal surface.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
title | PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD |
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