composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores

Disclosed are ester compositions, solvents, cleaning formulations, curing agents, reactive diluent solvents, controlled acid function release agents, polyol monomers, drilling mud and methods of making and using the same. Disclosed compositions include: a) about 10 to 60 weight percent methyl hydrox...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: RICHARD P. BEATTY
Format: Patent
Sprache:por
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator RICHARD P. BEATTY
description Disclosed are ester compositions, solvents, cleaning formulations, curing agents, reactive diluent solvents, controlled acid function release agents, polyol monomers, drilling mud and methods of making and using the same. Disclosed compositions include: a) about 10 to 60 weight percent methyl hydroxycaproate, b) about 20 to 80 weight percent dimethyl adipate; c) about 1 to 15 wt % of dimethyl glutarate; d) about 0.1 to 5 wt % of dimethyl succinate; e) about 0.1 to 7 wt % of at least one cyclohexanediot; and f) less than about 20 wt % oligomeric esters.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_BRPI0916470A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>BRPI0916470A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_BRPI0916470A23</originalsourceid><addsrcrecordid>eNqNkL1OQzEMRsvAgIB3sJgvUvkRiBFQEWwIsVdu4lSRcuNgJxWvgxhQd97gvhjJbVk6dYkV5_PJSY4OZob7xOqHn-GbO1AOK4qZOsBlq2AJTBHsIGCPbZdIXG1s80I9r8iytKPsY65J-syCubYc11VIveaRhZY-ClqGhIJQlCEiOFyINxveyBe2JbMCBcoy_EZvWHcuWgo63ySD71MFSgf9sM78j7Zex4cIlCrdDCLuRCjaImTGCGhZ6OgMTvzwtaIAVYSDH9ZVXaoTtaE6i206e9mYUv0a5co_mRw6DEqn23o8OXuavT8-n1PiOWlCQ5Hy_OHt9WV6d3FzfTu9v7zaK_QHGeOacA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores</title><source>esp@cenet</source><creator>RICHARD P. BEATTY</creator><creatorcontrib>RICHARD P. BEATTY</creatorcontrib><description>Disclosed are ester compositions, solvents, cleaning formulations, curing agents, reactive diluent solvents, controlled acid function release agents, polyol monomers, drilling mud and methods of making and using the same. Disclosed compositions include: a) about 10 to 60 weight percent methyl hydroxycaproate, b) about 20 to 80 weight percent dimethyl adipate; c) about 1 to 15 wt % of dimethyl glutarate; d) about 0.1 to 5 wt % of dimethyl succinate; e) about 0.1 to 7 wt % of at least one cyclohexanediot; and f) less than about 20 wt % oligomeric esters.</description><language>por</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160216&amp;DB=EPODOC&amp;CC=BR&amp;NR=PI0916470A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160216&amp;DB=EPODOC&amp;CC=BR&amp;NR=PI0916470A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RICHARD P. BEATTY</creatorcontrib><title>composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores</title><description>Disclosed are ester compositions, solvents, cleaning formulations, curing agents, reactive diluent solvents, controlled acid function release agents, polyol monomers, drilling mud and methods of making and using the same. Disclosed compositions include: a) about 10 to 60 weight percent methyl hydroxycaproate, b) about 20 to 80 weight percent dimethyl adipate; c) about 1 to 15 wt % of dimethyl glutarate; d) about 0.1 to 5 wt % of dimethyl succinate; e) about 0.1 to 7 wt % of at least one cyclohexanediot; and f) less than about 20 wt % oligomeric esters.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNkL1OQzEMRsvAgIB3sJgvUvkRiBFQEWwIsVdu4lSRcuNgJxWvgxhQd97gvhjJbVk6dYkV5_PJSY4OZob7xOqHn-GbO1AOK4qZOsBlq2AJTBHsIGCPbZdIXG1s80I9r8iytKPsY65J-syCubYc11VIveaRhZY-ClqGhIJQlCEiOFyINxveyBe2JbMCBcoy_EZvWHcuWgo63ySD71MFSgf9sM78j7Zex4cIlCrdDCLuRCjaImTGCGhZ6OgMTvzwtaIAVYSDH9ZVXaoTtaE6i206e9mYUv0a5co_mRw6DEqn23o8OXuavT8-n1PiOWlCQ5Hy_OHt9WV6d3FzfTu9v7zaK_QHGeOacA</recordid><startdate>20160216</startdate><enddate>20160216</enddate><creator>RICHARD P. BEATTY</creator><scope>EVB</scope></search><sort><creationdate>20160216</creationdate><title>composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores</title><author>RICHARD P. BEATTY</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_BRPI0916470A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>por</language><creationdate>2016</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>RICHARD P. BEATTY</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RICHARD P. BEATTY</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores</title><date>2016-02-16</date><risdate>2016</risdate><abstract>Disclosed are ester compositions, solvents, cleaning formulations, curing agents, reactive diluent solvents, controlled acid function release agents, polyol monomers, drilling mud and methods of making and using the same. Disclosed compositions include: a) about 10 to 60 weight percent methyl hydroxycaproate, b) about 20 to 80 weight percent dimethyl adipate; c) about 1 to 15 wt % of dimethyl glutarate; d) about 0.1 to 5 wt % of dimethyl succinate; e) about 0.1 to 7 wt % of at least one cyclohexanediot; and f) less than about 20 wt % oligomeric esters.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language por
recordid cdi_epo_espacenet_BRPI0916470A2
source esp@cenet
subjects ACYCLIC OR CARBOCYCLIC COMPOUNDS
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
title composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T13%3A32%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RICHARD%20P.%20BEATTY&rft.date=2016-02-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EBRPI0916470A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true