APARELHO,PROCESSO PARA LIMPEZA E PROCESSO PARA LIMPEZA DE APARELHO

Particles adhering to the internal surfaces of an object are removed by the movement of a shock wave past the surfaces. The shock wave is generated by the explosion of a gas in a chamber located inside the object. The invention has particular application for use in cleaning process equipment.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KAM BOR LEE, DAN K. PUCKETT, ALLAN C. MORGAN, L. WILLARD RICHARDS
Format: Patent
Sprache:por
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Particles adhering to the internal surfaces of an object are removed by the movement of a shock wave past the surfaces. The shock wave is generated by the explosion of a gas in a chamber located inside the object. The invention has particular application for use in cleaning process equipment.