solução para o processamento de máquinas
a presente invenção refere-se a uma solução para o processamento de máquinas inclui uma base lubrificante incluindo polialquileno glicol, um tensoativo à base de flúor ou um tensoativo catiônico e água. a base lubrificante inclui pelo me-nos um de um bloco inverso de polioxietileno/polioxipropileno,...
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| creator | HIDEKAZU INAGAKI TARO TAKEUCHI HIROFUMI IENAGA |
| description | a presente invenção refere-se a uma solução para o processamento de máquinas inclui uma base lubrificante incluindo polialquileno glicol, um tensoativo à base de flúor ou um tensoativo catiônico e água. a base lubrificante inclui pelo me-nos um de um bloco inverso de polioxietileno/polioxipropileno, um condensado de etilenodiaminapolioxialquileno, polioxietilenopolioxipropileno glicol e um polímero de óxido de etileno e óxido de propileno, como polialquileno glicol.
A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate, polyoxyethylene polyoxypropylene glycol, and an ethylene oxide propylene oxide polymer, as polyalkylene glycol. |
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A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate, polyoxyethylene polyoxypropylene glycol, and an ethylene oxide propylene oxide polymer, as polyalkylene glycol.</description><language>por</language><subject>AIRCRAFT ; AVIATION ; CHEMISTRY ; COSMONAUTICS ; DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING ORREPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR ; FUELS ; GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLYADAPTED FOR USE IN CONNECTION WITH AIRCRAFT ; HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFTCOMPONENTS, NOT OTHERWISE PROVIDED FOR ; INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATINGCOMPOSITIONS ; LUBRICANTS ; LUBRICATING COMPOSITIONS ; METALLURGY ; PEAT ; PERFORMING OPERATIONS ; PETROLEUM, GAS OR COKE INDUSTRIES ; TECHNICAL GASES CONTAINING CARBON MONOXIDE ; TRANSPORTING ; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200609&DB=EPODOC&CC=BR&NR=112019024542A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200609&DB=EPODOC&CC=BR&NR=112019024542A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIDEKAZU INAGAKI</creatorcontrib><creatorcontrib>TARO TAKEUCHI</creatorcontrib><creatorcontrib>HIROFUMI IENAGA</creatorcontrib><title>solução para o processamento de máquinas</title><description>a presente invenção refere-se a uma solução para o processamento de máquinas inclui uma base lubrificante incluindo polialquileno glicol, um tensoativo à base de flúor ou um tensoativo catiônico e água. a base lubrificante inclui pelo me-nos um de um bloco inverso de polioxietileno/polioxipropileno, um condensado de etilenodiaminapolioxialquileno, polioxietilenopolioxipropileno glicol e um polímero de óxido de etileno e óxido de propileno, como polialquileno glicol.
A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate, polyoxyethylene polyoxypropylene glycol, and an ethylene oxide propylene oxide polymer, as polyalkylene glycol.</description><subject>AIRCRAFT</subject><subject>AVIATION</subject><subject>CHEMISTRY</subject><subject>COSMONAUTICS</subject><subject>DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING ORREPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR</subject><subject>FUELS</subject><subject>GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLYADAPTED FOR USE IN CONNECTION WITH AIRCRAFT</subject><subject>HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFTCOMPONENTS, NOT OTHERWISE PROVIDED FOR</subject><subject>INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATINGCOMPOSITIONS</subject><subject>LUBRICANTS</subject><subject>LUBRICATING COMPOSITIONS</subject><subject>METALLURGY</subject><subject>PEAT</subject><subject>PERFORMING OPERATIONS</subject><subject>PETROLEUM, GAS OR COKE INDUSTRIES</subject><subject>TECHNICAL GASES CONTAINING CARBON MONOXIDE</subject><subject>TRANSPORTING</subject><subject>USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAuzs8pPbz88OJ8hYLEokQFIFWUn5xaXJyYm5pXkq-QkqqQe3hhYWlmXmIxDwNrWmJOcSovlOZmUHVzDXH20E0tyI9PLS5ITE7NSy2JdwoyNDQyMLQ0MDIxNTFyNDImVh0ApWwtBQ</recordid><startdate>20200609</startdate><enddate>20200609</enddate><creator>HIDEKAZU INAGAKI</creator><creator>TARO TAKEUCHI</creator><creator>HIROFUMI IENAGA</creator><scope>EVB</scope></search><sort><creationdate>20200609</creationdate><title>solução para o processamento de máquinas</title><author>HIDEKAZU INAGAKI ; TARO TAKEUCHI ; HIROFUMI IENAGA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_BR112019024542A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>por</language><creationdate>2020</creationdate><topic>AIRCRAFT</topic><topic>AVIATION</topic><topic>CHEMISTRY</topic><topic>COSMONAUTICS</topic><topic>DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING ORREPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR</topic><topic>FUELS</topic><topic>GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLYADAPTED FOR USE IN CONNECTION WITH AIRCRAFT</topic><topic>HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFTCOMPONENTS, NOT OTHERWISE PROVIDED FOR</topic><topic>INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATINGCOMPOSITIONS</topic><topic>LUBRICANTS</topic><topic>LUBRICATING COMPOSITIONS</topic><topic>METALLURGY</topic><topic>PEAT</topic><topic>PERFORMING OPERATIONS</topic><topic>PETROLEUM, GAS OR COKE INDUSTRIES</topic><topic>TECHNICAL GASES CONTAINING CARBON MONOXIDE</topic><topic>TRANSPORTING</topic><topic>USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION</topic><toplevel>online_resources</toplevel><creatorcontrib>HIDEKAZU INAGAKI</creatorcontrib><creatorcontrib>TARO TAKEUCHI</creatorcontrib><creatorcontrib>HIROFUMI IENAGA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIDEKAZU INAGAKI</au><au>TARO TAKEUCHI</au><au>HIROFUMI IENAGA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>solução para o processamento de máquinas</title><date>2020-06-09</date><risdate>2020</risdate><abstract>a presente invenção refere-se a uma solução para o processamento de máquinas inclui uma base lubrificante incluindo polialquileno glicol, um tensoativo à base de flúor ou um tensoativo catiônico e água. a base lubrificante inclui pelo me-nos um de um bloco inverso de polioxietileno/polioxipropileno, um condensado de etilenodiaminapolioxialquileno, polioxietilenopolioxipropileno glicol e um polímero de óxido de etileno e óxido de propileno, como polialquileno glicol.
A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate, polyoxyethylene polyoxypropylene glycol, and an ethylene oxide propylene oxide polymer, as polyalkylene glycol.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AIRCRAFT AVIATION CHEMISTRY COSMONAUTICS DESIGNING, MANUFACTURING, ASSEMBLING, CLEANING, MAINTAINING ORREPAIRING AIRCRAFT, NOT OTHERWISE PROVIDED FOR FUELS GROUND OR AIRCRAFT-CARRIER-DECK INSTALLATIONS SPECIALLYADAPTED FOR USE IN CONNECTION WITH AIRCRAFT HANDLING, TRANSPORTING, TESTING OR INSPECTING AIRCRAFTCOMPONENTS, NOT OTHERWISE PROVIDED FOR INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATINGCOMPOSITIONS LUBRICANTS LUBRICATING COMPOSITIONS METALLURGY PEAT PERFORMING OPERATIONS PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MONOXIDE TRANSPORTING USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION |
| title | solução para o processamento de máquinas |
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