Absorvedores de radiação uv de benzotriazol dotados de maior durabilidade
Patente de Invenção: "ABSORVEDORES DE RADIAçãO UV DE BENZOTRIAZOL DOTADOS DE MAIOR DURABILIDADE''. Trata-se de absorvedores de radiação UV de benzotriazol que são substituídos na posição 5 do anel benzo por um grupo removedor de elétrons que apresentam uma maior durabilidade e taxas d...
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creator | MERVIN GALE WOOD JR ROBERT EDWARD DETLEFSEN JOSEPH SUHADOLNIK JEAN-PIERRE WOLF RAMANATHAN RAVICHANDRAN ANTHONY DAVID DEBELLIS REVATHI IYENGAR |
description | Patente de Invenção: "ABSORVEDORES DE RADIAçãO UV DE BENZOTRIAZOL DOTADOS DE MAIOR DURABILIDADE''. Trata-se de absorvedores de radiação UV de benzotriazol que são substituídos na posição 5 do anel benzo por um grupo removedor de elétrons que apresentam uma maior durabilidade e taxas de perda muito baixas quando incorporados a revestimentos automotivos. Este é em particular o caso quando a posição 3 do anel fenila também é substituída por fenila ou fenilalquila tal como a-cumila. Os compostos nos quais a posição 5 do anel benzo é substituída por perfluoroalquila, tal como trifluorometila, são de interesse particular quanto à sua maior durabilidade e quanto à sua excelente solubilidade e excelentes propriedades de cor em algumas composições termoplásticas.
Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as alpha-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl. |
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Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as alpha-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.</description><edition>7</edition><language>por</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; HETEROCYCLIC COMPOUNDS ; INKS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000926&DB=EPODOC&CC=BR&NR=0000124A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000926&DB=EPODOC&CC=BR&NR=0000124A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MERVIN GALE WOOD JR</creatorcontrib><creatorcontrib>ROBERT EDWARD DETLEFSEN</creatorcontrib><creatorcontrib>JOSEPH SUHADOLNIK</creatorcontrib><creatorcontrib>JEAN-PIERRE WOLF</creatorcontrib><creatorcontrib>RAMANATHAN RAVICHANDRAN</creatorcontrib><creatorcontrib>ANTHONY DAVID DEBELLIS</creatorcontrib><creatorcontrib>REVATHI IYENGAR</creatorcontrib><title>Absorvedores de radiação uv de benzotriazol dotados de maior durabilidade</title><description>Patente de Invenção: "ABSORVEDORES DE RADIAçãO UV DE BENZOTRIAZOL DOTADOS DE MAIOR DURABILIDADE''. Trata-se de absorvedores de radiação UV de benzotriazol que são substituídos na posição 5 do anel benzo por um grupo removedor de elétrons que apresentam uma maior durabilidade e taxas de perda muito baixas quando incorporados a revestimentos automotivos. Este é em particular o caso quando a posição 3 do anel fenila também é substituída por fenila ou fenilalquila tal como a-cumila. Os compostos nos quais a posição 5 do anel benzo é substituída por perfluoroalquila, tal como trifluorometila, são de interesse particular quanto à sua maior durabilidade e quanto à sua excelente solubilidade e excelentes propriedades de cor em algumas composições termoplásticas.
Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as alpha-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>INKS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB2TCrOLypLTckvSi1WSElVKEpMyUw8vPzw4nyF0jKQQFJqXlV-SVFmYlV-jkJKfkliSj5YYW5iZn6RQkppUWJSZk5mSmJKKg8Da1piTnEqL5TmZpB3cw1x9tBNLciPTy0uSExOzUstiXcKMgACQyMTR2PCKgBEFDXa</recordid><startdate>20000926</startdate><enddate>20000926</enddate><creator>MERVIN GALE WOOD JR</creator><creator>ROBERT EDWARD DETLEFSEN</creator><creator>JOSEPH SUHADOLNIK</creator><creator>JEAN-PIERRE WOLF</creator><creator>RAMANATHAN RAVICHANDRAN</creator><creator>ANTHONY DAVID DEBELLIS</creator><creator>REVATHI IYENGAR</creator><scope>EVB</scope></search><sort><creationdate>20000926</creationdate><title>Absorvedores de radiação uv de benzotriazol dotados de maior durabilidade</title><author>MERVIN GALE WOOD JR ; ROBERT EDWARD DETLEFSEN ; JOSEPH SUHADOLNIK ; JEAN-PIERRE WOLF ; RAMANATHAN RAVICHANDRAN ; ANTHONY DAVID DEBELLIS ; REVATHI IYENGAR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_BR0000124A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>por</language><creationdate>2000</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>INKS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>MERVIN GALE WOOD JR</creatorcontrib><creatorcontrib>ROBERT EDWARD DETLEFSEN</creatorcontrib><creatorcontrib>JOSEPH SUHADOLNIK</creatorcontrib><creatorcontrib>JEAN-PIERRE WOLF</creatorcontrib><creatorcontrib>RAMANATHAN RAVICHANDRAN</creatorcontrib><creatorcontrib>ANTHONY DAVID DEBELLIS</creatorcontrib><creatorcontrib>REVATHI IYENGAR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MERVIN GALE WOOD JR</au><au>ROBERT EDWARD DETLEFSEN</au><au>JOSEPH SUHADOLNIK</au><au>JEAN-PIERRE WOLF</au><au>RAMANATHAN RAVICHANDRAN</au><au>ANTHONY DAVID DEBELLIS</au><au>REVATHI IYENGAR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Absorvedores de radiação uv de benzotriazol dotados de maior durabilidade</title><date>2000-09-26</date><risdate>2000</risdate><abstract>Patente de Invenção: "ABSORVEDORES DE RADIAçãO UV DE BENZOTRIAZOL DOTADOS DE MAIOR DURABILIDADE''. Trata-se de absorvedores de radiação UV de benzotriazol que são substituídos na posição 5 do anel benzo por um grupo removedor de elétrons que apresentam uma maior durabilidade e taxas de perda muito baixas quando incorporados a revestimentos automotivos. Este é em particular o caso quando a posição 3 do anel fenila também é substituída por fenila ou fenilalquila tal como a-cumila. Os compostos nos quais a posição 5 do anel benzo é substituída por perfluoroalquila, tal como trifluorometila, são de interesse particular quanto à sua maior durabilidade e quanto à sua excelente solubilidade e excelentes propriedades de cor em algumas composições termoplásticas.
Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as alpha-cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES FILLING PASTES HETEROCYCLIC COMPOUNDS INKS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS THEREFOR WOODSTAINS |
title | Absorvedores de radiação uv de benzotriazol dotados de maior durabilidade |
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