PHOTOPOLYMERISABLE COMPOSITIONS
Photopolymerisable compsn. contains >=1 constituent which is polymerisable or hardenable by acids and a photosensitiser having the formula: where A is S, Se or Te; n is 1 or 2; R1, R2, and R3 are each independently an opt. substd. hydrocarbyl radical or a heterocyclic radical or two of R1, R2 and...
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| creator | JOSEF NEMCEK |
| description | Photopolymerisable compsn. contains >=1 constituent which is polymerisable or hardenable by acids and a photosensitiser having the formula: where A is S, Se or Te; n is 1 or 2; R1, R2, and R3 are each independently an opt. substd. hydrocarbyl radical or a heterocyclic radical or two of R1, R2 and R3 form a heterocycle with A and the other one of them is hydrocarbyl; Xn- is the anion of an acid which is able to polymerise or harden the above constituent. The compsns. are used for printing plates, printed circuits etc. The compsns. can be stored for long time in the dark without gelification and therefore do not require an inhibitor in this respect. Also the compsn. avoids the use of toxic cpds. such as transition metal carbonyls and N-nitrosamines used in previous process. |
| format | Patent |
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The compsns. are used for printing plates, printed circuits etc. The compsns. can be stored for long time in the dark without gelification and therefore do not require an inhibitor in this respect. 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The compsns. are used for printing plates, printed circuits etc. The compsns. can be stored for long time in the dark without gelification and therefore do not require an inhibitor in this respect. Also the compsn. avoids the use of toxic cpds. such as transition metal carbonyls and N-nitrosamines used in previous process.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1977</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAP8PAP8Q_w94n0dQ3yDHZ08nFVcPb3DfAP9gzx9PcL5mFgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8Y6hFiYWlpbmpo7GhFUAAJOcIZk</recordid><startdate>19770324</startdate><enddate>19770324</enddate><creator>JOSEF NEMCEK</creator><scope>EVB</scope></search><sort><creationdate>19770324</creationdate><title>PHOTOPOLYMERISABLE COMPOSITIONS</title><author>JOSEF NEMCEK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_AU8489975A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1977</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>JOSEF NEMCEK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JOSEF NEMCEK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOPOLYMERISABLE COMPOSITIONS</title><date>1977-03-24</date><risdate>1977</risdate><abstract>Photopolymerisable compsn. contains >=1 constituent which is polymerisable or hardenable by acids and a photosensitiser having the formula: where A is S, Se or Te; n is 1 or 2; R1, R2, and R3 are each independently an opt. substd. hydrocarbyl radical or a heterocyclic radical or two of R1, R2 and R3 form a heterocycle with A and the other one of them is hydrocarbyl; Xn- is the anion of an acid which is able to polymerise or harden the above constituent. The compsns. are used for printing plates, printed circuits etc. The compsns. can be stored for long time in the dark without gelification and therefore do not require an inhibitor in this respect. Also the compsn. avoids the use of toxic cpds. such as transition metal carbonyls and N-nitrosamines used in previous process.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PHOTOPOLYMERISABLE COMPOSITIONS |
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