Film for containment of halogenated aromatic compounds and devices using them

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Hauptverfasser: RODNEY K. HEHENBERGER, SARA L. MEGCHELSEN, RICHARD L. JACOBSON
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SARA L. MEGCHELSEN
RICHARD L. JACOBSON
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subjects AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
MEASURING
MEASURING QUANTITY OF HEAT
MEASURING TEMPERATURE
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PHYSICS
TESTING
THEIR PREPARATION OR CHEMICAL WORKING-UP
THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
WORKING-UP
title Film for containment of halogenated aromatic compounds and devices using them
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