Method and apparatus for chemical delivery through the brush
In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a fi...
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creator | DOUGLAS G. GARDNER JOHN M. DELARIOS MIKHAIL RAVKIN |
description | In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_AU7264596A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>AU7264596A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_AU7264596A3</originalsourceid><addsrcrecordid>eNrjZLDxTS3JyE9RSMwD4oKCxKLEktJihbT8IoXkjNTczOTEHIWU1JzMstSiSoWSjKL80vQMIJ2qkFRUWpzBw8CalphTnMoLpbkZ5N1cQ5w9dFML8uNTiwsSk1PzUkviHUPNjcxMTC3NHI0JqwAAL0kvIw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for chemical delivery through the brush</title><source>esp@cenet</source><creator>DOUGLAS G. GARDNER ; JOHN M. DELARIOS ; MIKHAIL RAVKIN</creator><creatorcontrib>DOUGLAS G. GARDNER ; JOHN M. DELARIOS ; MIKHAIL RAVKIN</creatorcontrib><description>In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BRUSHES ; BRUSHWARE ; CLEANING ; CLEANING IN GENERAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HUMAN NECESSITIES ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970430&DB=EPODOC&CC=AU&NR=7264596A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970430&DB=EPODOC&CC=AU&NR=7264596A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DOUGLAS G. GARDNER</creatorcontrib><creatorcontrib>JOHN M. DELARIOS</creatorcontrib><creatorcontrib>MIKHAIL RAVKIN</creatorcontrib><title>Method and apparatus for chemical delivery through the brush</title><description>In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BRUSHES</subject><subject>BRUSHWARE</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HUMAN NECESSITIES</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1997</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDxTS3JyE9RSMwD4oKCxKLEktJihbT8IoXkjNTczOTEHIWU1JzMstSiSoWSjKL80vQMIJ2qkFRUWpzBw8CalphTnMoLpbkZ5N1cQ5w9dFML8uNTiwsSk1PzUkviHUPNjcxMTC3NHI0JqwAAL0kvIw</recordid><startdate>19970430</startdate><enddate>19970430</enddate><creator>DOUGLAS G. GARDNER</creator><creator>JOHN M. DELARIOS</creator><creator>MIKHAIL RAVKIN</creator><scope>EVB</scope></search><sort><creationdate>19970430</creationdate><title>Method and apparatus for chemical delivery through the brush</title><author>DOUGLAS G. GARDNER ; JOHN M. DELARIOS ; MIKHAIL RAVKIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_AU7264596A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1997</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BRUSHES</topic><topic>BRUSHWARE</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HUMAN NECESSITIES</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>DOUGLAS G. GARDNER</creatorcontrib><creatorcontrib>JOHN M. DELARIOS</creatorcontrib><creatorcontrib>MIKHAIL RAVKIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DOUGLAS G. GARDNER</au><au>JOHN M. DELARIOS</au><au>MIKHAIL RAVKIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for chemical delivery through the brush</title><date>1997-04-30</date><risdate>1997</risdate><abstract>In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS BRUSHES BRUSHWARE CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HUMAN NECESSITIES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING |
title | Method and apparatus for chemical delivery through the brush |
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