Device for residual-monomer removal

A device for residual-monomer removal by which residual monomers can be efficiently removed from a slurry containing a vinyl-chloride-based resin, while preventing the residual monomers from being discharged from the process. The device for residual-monomer removal comprises: a column body 4; a plur...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MIZUTA Hiromasa, CHIYODA Takahiro, SANO Norihisa
Format: Patent
Sprache:eng
Schlagworte:
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