Apparatus for metering granular source material in a thin film vapor deposition apparatus
APPARATUS FOR METERING GRANULAR SOURCE MATERIAL IN A THIN FILM VAPOR DEPOSITION APPARATUS A metering mechanism is configured for transferring measured doses of a granular material from a first location to a second location, and is particularly suited for metering source material in a vapor depositio...
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creator | LITTLE, EDWIN JACKSON |
description | APPARATUS FOR METERING GRANULAR SOURCE MATERIAL IN A THIN FILM VAPOR DEPOSITION APPARATUS A metering mechanism is configured for transferring measured doses of a granular material from a first location to a second location, and is particularly suited for metering source material in a vapor deposition apparatus. A receiver is disposed to receive the granular material from the first location. A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. The amount of granular material transferred from the first location to the second location is a function of the volume of the passage and the reciprocating rate of the delivery member. oco -W |
format | Patent |
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A receiver is disposed to receive the granular material from the first location. A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. 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A receiver is disposed to receive the granular material from the first location. A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. The amount of granular material transferred from the first location to the second location is a function of the volume of the passage and the reciprocating rate of the delivery member. oco -W</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLsKAjEQRdNYiPoPA9YLSawsgyj7AVpYLcM6WQN5MUn8fiNob3WKc-5di7vJGRlrK2ATQ6BK7OICC2NsHhlKajwTBPwI9OAiINRnh3U-wAtznz0op-KqS13-_rZiZdEX2n25EfvL-Xoah95OVDLOFKlO5qal0loepVZGHf6r3v2iO88</recordid><startdate>20130221</startdate><enddate>20130221</enddate><creator>LITTLE, EDWIN JACKSON</creator><scope>EVB</scope></search><sort><creationdate>20130221</creationdate><title>Apparatus for metering granular source material in a thin film vapor deposition apparatus</title><author>LITTLE, EDWIN JACKSON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_AU2012209021A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LITTLE, EDWIN JACKSON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LITTLE, EDWIN JACKSON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for metering granular source material in a thin film vapor deposition apparatus</title><date>2013-02-21</date><risdate>2013</risdate><abstract>APPARATUS FOR METERING GRANULAR SOURCE MATERIAL IN A THIN FILM VAPOR DEPOSITION APPARATUS A metering mechanism is configured for transferring measured doses of a granular material from a first location to a second location, and is particularly suited for metering source material in a vapor deposition apparatus. A receiver is disposed to receive the granular material from the first location. A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. The amount of granular material transferred from the first location to the second location is a function of the volume of the passage and the reciprocating rate of the delivery member. oco -W</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Apparatus for metering granular source material in a thin film vapor deposition apparatus |
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