Hydrogen gas recovery system and hydrogen gas separation and recovery method

The amount of supplemental hydrogen, which is used for separating the reactant exhaust of a polycrystalline silicon production apparatus, is reduced as much as possible. Reactant exhaust, in which a chlorosilane and hydrogen chloride have been removed by a hydrogen chloride absorption apparatus (30)...

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Bibliographische Detailangaben
1. Verfasser: KUROSAWA, YASUSHI
Format: Patent
Sprache:eng
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