METHOD FOR REDUCING CONTACT DEFECTS IN SEMICONDUCTOR CELLS

A method and system for providing at least one contact in a semiconductor device. The semiconductor device includes a substrate, an etch stop layer, an interlayer dielectric on the etch stop layer, an anti-reflective coating layer on the interlayer dielectric, and at least one feature below the etch...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AMY, C. TU, ANGELA, T. HUI, WENMEI LI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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