METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: STEFFEN FRITZSCHE, JEAN-NOEL FEHR, JOHANNES LIPPERT, HARALD KIRCHNER, MICHAEL MUHLBEYER
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator STEFFEN FRITZSCHE
JEAN-NOEL FEHR
JOHANNES LIPPERT
HARALD KIRCHNER
MICHAEL MUHLBEYER
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_AU2003240653A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>AU2003240653A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_AU2003240653A13</originalsourceid><addsrcrecordid>eNrjZLD0dQ3x8HdRcPMPUgjxcFUIcQxydw1xdVFwcQUK-TqGePr7Kfi7KTgCyYAQT2dHHwVXH1dfV78QHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oS7xhqZGBgbGRiYGZq7GhoTJwqAAMzKS0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT</title><source>esp@cenet</source><creator>STEFFEN FRITZSCHE ; JEAN-NOEL FEHR ; JOHANNES LIPPERT ; HARALD KIRCHNER ; MICHAEL MUHLBEYER</creator><creatorcontrib>STEFFEN FRITZSCHE ; JEAN-NOEL FEHR ; JOHANNES LIPPERT ; HARALD KIRCHNER ; MICHAEL MUHLBEYER</creatorcontrib><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20031202&amp;DB=EPODOC&amp;CC=AU&amp;NR=2003240653A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20031202&amp;DB=EPODOC&amp;CC=AU&amp;NR=2003240653A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STEFFEN FRITZSCHE</creatorcontrib><creatorcontrib>JEAN-NOEL FEHR</creatorcontrib><creatorcontrib>JOHANNES LIPPERT</creatorcontrib><creatorcontrib>HARALD KIRCHNER</creatorcontrib><creatorcontrib>MICHAEL MUHLBEYER</creatorcontrib><title>METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD0dQ3x8HdRcPMPUgjxcFUIcQxydw1xdVFwcQUK-TqGePr7Kfi7KTgCyYAQT2dHHwVXH1dfV78QHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oS7xhqZGBgbGRiYGZq7GhoTJwqAAMzKS0</recordid><startdate>20031202</startdate><enddate>20031202</enddate><creator>STEFFEN FRITZSCHE</creator><creator>JEAN-NOEL FEHR</creator><creator>JOHANNES LIPPERT</creator><creator>HARALD KIRCHNER</creator><creator>MICHAEL MUHLBEYER</creator><scope>EVB</scope></search><sort><creationdate>20031202</creationdate><title>METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT</title><author>STEFFEN FRITZSCHE ; JEAN-NOEL FEHR ; JOHANNES LIPPERT ; HARALD KIRCHNER ; MICHAEL MUHLBEYER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_AU2003240653A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>STEFFEN FRITZSCHE</creatorcontrib><creatorcontrib>JEAN-NOEL FEHR</creatorcontrib><creatorcontrib>JOHANNES LIPPERT</creatorcontrib><creatorcontrib>HARALD KIRCHNER</creatorcontrib><creatorcontrib>MICHAEL MUHLBEYER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STEFFEN FRITZSCHE</au><au>JEAN-NOEL FEHR</au><au>JOHANNES LIPPERT</au><au>HARALD KIRCHNER</au><au>MICHAEL MUHLBEYER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT</title><date>2003-12-02</date><risdate>2003</risdate><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_AU2003240653A1
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title METHOD FOR THE TARGETED DEFORMATION OF AN OPTICAL ELEMENT
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-30T23%3A27%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=STEFFEN%20FRITZSCHE&rft.date=2003-12-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EAU2003240653A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true