STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX

A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their u...

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Hauptverfasser: YAMADA, KENJI, KUMANO, ATSUSHI, KONNO, KEIJI, BESSHO, NOBUO
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creator YAMADA, KENJI
KUMANO, ATSUSHI
KONNO, KEIJI
BESSHO, NOBUO
description A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_ATE498634TT1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ATE498634TT1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_ATE498634TT13</originalsourceid><addsrcrecordid>eNrjZKgODgly9PAJ9XMPdvUNcPP0c_HxdPZwVYgKDXb09XX1C3YNiQJKKvh6hiiEuQYdbvFzcQ0CK_FVcApydfYA6QTqco1QCPVzASlxc_QIcvUDGhCE0AAywcU1GE0HDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2JdwxxNbG0MDM2CQkxNCZGDQD5Dj4y</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX</title><source>esp@cenet</source><creator>YAMADA, KENJI ; KUMANO, ATSUSHI ; KONNO, KEIJI ; BESSHO, NOBUO</creator><creatorcontrib>YAMADA, KENJI ; KUMANO, ATSUSHI ; KONNO, KEIJI ; BESSHO, NOBUO</creatorcontrib><description>A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.</description><language>ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110315&amp;DB=EPODOC&amp;CC=AT&amp;NR=E498634T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110315&amp;DB=EPODOC&amp;CC=AT&amp;NR=E498634T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMADA, KENJI</creatorcontrib><creatorcontrib>KUMANO, ATSUSHI</creatorcontrib><creatorcontrib>KONNO, KEIJI</creatorcontrib><creatorcontrib>BESSHO, NOBUO</creatorcontrib><title>STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX</title><description>A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgODgly9PAJ9XMPdvUNcPP0c_HxdPZwVYgKDXb09XX1C3YNiQJKKvh6hiiEuQYdbvFzcQ0CK_FVcApydfYA6QTqco1QCPVzASlxc_QIcvUDGhCE0AAywcU1GE0HDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2JdwxxNbG0MDM2CQkxNCZGDQD5Dj4y</recordid><startdate>20110315</startdate><enddate>20110315</enddate><creator>YAMADA, KENJI</creator><creator>KUMANO, ATSUSHI</creator><creator>KONNO, KEIJI</creator><creator>BESSHO, NOBUO</creator><scope>EVB</scope></search><sort><creationdate>20110315</creationdate><title>STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX</title><author>YAMADA, KENJI ; KUMANO, ATSUSHI ; KONNO, KEIJI ; BESSHO, NOBUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_ATE498634TT13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2011</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMADA, KENJI</creatorcontrib><creatorcontrib>KUMANO, ATSUSHI</creatorcontrib><creatorcontrib>KONNO, KEIJI</creatorcontrib><creatorcontrib>BESSHO, NOBUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMADA, KENJI</au><au>KUMANO, ATSUSHI</au><au>KONNO, KEIJI</au><au>BESSHO, NOBUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX</title><date>2011-03-15</date><risdate>2011</risdate><abstract>A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
title STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG MIT VERÄNDERLICHEM BRECHUNGSINDEX UND VERFAHREN ZUR VERÄNDERUNG DES BRECHUNGSINDEX
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