PULVERZUFUHRSYSTEM FÜR EINE DETONATIONSSPRÜHPISTOLE
The powder injection system is comprised of a dosing chamber (2) which is directly supplied by a conventional powder supplier (7) and communicates with the barrel (1) of the detonation gun through a direct conduit (5). Thus, the pressure wave which progresses through the barrel (1) enters through th...
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| creator | FAGOAGA ALTUNA, IGNACIO DE JUAN LANDABURU, JULIAN BARYKIN, GEORGIY |
| description | The powder injection system is comprised of a dosing chamber (2) which is directly supplied by a conventional powder supplier (7) and communicates with the barrel (1) of the detonation gun through a direct conduit (5). Thus, the pressure wave which progresses through the barrel (1) enters through the communication conduits (5) and, when reaching the dosing chamber (2), is subjected to a sudden expansion which stops the powder supply from the continuous supplier (7) and produces the complete fluidification of the powder contained in the dosing chamber (2). The fluidized powder will then be entrained by suction up to the barrel (1) where it resides until the pressure wave generated in a new detonation cycle entrains said powder to deposit it to the surface of the part to be coated. |
| format | Patent |
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Thus, the pressure wave which progresses through the barrel (1) enters through the communication conduits (5) and, when reaching the dosing chamber (2), is subjected to a sudden expansion which stops the powder supply from the continuous supplier (7) and produces the complete fluidification of the powder contained in the dosing chamber (2). The fluidized powder will then be entrained by suction up to the barrel (1) where it resides until the pressure wave generated in a new detonation cycle entrains said powder to deposit it to the surface of the part to be coated.</description><language>ger</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; NOZZLES ; PERFORMING OPERATIONS ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110115&DB=EPODOC&CC=AT&NR=E491524T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110115&DB=EPODOC&CC=AT&NR=E491524T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FAGOAGA ALTUNA, IGNACIO</creatorcontrib><creatorcontrib>DE JUAN LANDABURU, JULIAN</creatorcontrib><creatorcontrib>BARYKIN, GEORGIY</creatorcontrib><title>PULVERZUFUHRSYSTEM FÜR EINE DETONATIONSSPRÜHPISTOLE</title><description>The powder injection system is comprised of a dosing chamber (2) which is directly supplied by a conventional powder supplier (7) and communicates with the barrel (1) of the detonation gun through a direct conduit (5). Thus, the pressure wave which progresses through the barrel (1) enters through the communication conduits (5) and, when reaching the dosing chamber (2), is subjected to a sudden expansion which stops the powder supply from the continuous supplier (7) and produces the complete fluidification of the powder contained in the dosing chamber (2). The fluidized powder will then be entrained by suction up to the barrel (1) where it resides until the pressure wave generated in a new detonation cycle entrains said powder to deposit it to the surface of the part to be coated.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>NOZZLES</subject><subject>PERFORMING OPERATIONS</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDANCPUJcw2KCnUL9QgKjgwOcfVVcDs8J0jB1dPPVcHFNcTfzzHE098vODgg6PAcjwDP4BB_H1ceBta0xJziVF4ozc2g6OYa4uyhm1qQH59aXJCYnJqXWhLvGOJqYmloamQSEmJoTIwaACAcKtM</recordid><startdate>20110115</startdate><enddate>20110115</enddate><creator>FAGOAGA ALTUNA, IGNACIO</creator><creator>DE JUAN LANDABURU, JULIAN</creator><creator>BARYKIN, GEORGIY</creator><scope>EVB</scope></search><sort><creationdate>20110115</creationdate><title>PULVERZUFUHRSYSTEM FÜR EINE DETONATIONSSPRÜHPISTOLE</title><author>FAGOAGA ALTUNA, IGNACIO ; DE JUAN LANDABURU, JULIAN ; BARYKIN, GEORGIY</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_ATE491524TT13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2011</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>NOZZLES</topic><topic>PERFORMING OPERATIONS</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>FAGOAGA ALTUNA, IGNACIO</creatorcontrib><creatorcontrib>DE JUAN LANDABURU, JULIAN</creatorcontrib><creatorcontrib>BARYKIN, GEORGIY</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FAGOAGA ALTUNA, IGNACIO</au><au>DE JUAN LANDABURU, JULIAN</au><au>BARYKIN, GEORGIY</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PULVERZUFUHRSYSTEM FÜR EINE DETONATIONSSPRÜHPISTOLE</title><date>2011-01-15</date><risdate>2011</risdate><abstract>The powder injection system is comprised of a dosing chamber (2) which is directly supplied by a conventional powder supplier (7) and communicates with the barrel (1) of the detonation gun through a direct conduit (5). 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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NOZZLES PERFORMING OPERATIONS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | PULVERZUFUHRSYSTEM FÜR EINE DETONATIONSSPRÜHPISTOLE |
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