VERFAHREN UND ZUSAMMENSETZUNG ZUR HERSTELLUNG EINER MEHRSCHICHTIGEN LEITERPLATTE
In a process for fabricating a multilayer printed circuit board (20) with permanent innerlayers (10) of photoresist, the photo-imageable composition used to form the hard permanent layer comprises a polymerizable acrylate monomer; an oligomer consisting of the diester of a bisphenol A epoxy resin an...
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creator | RATH, JAMES KOES, THOMAS A TARA, VINAI MING NIZZO, VINCENT J FLYNN, KATHY M TRAN, WILLIAM LUONG-GIA |
description | In a process for fabricating a multilayer printed circuit board (20) with permanent innerlayers (10) of photoresist, the photo-imageable composition used to form the hard permanent layer comprises a polymerizable acrylate monomer; an oligomer consisting of the diester of a bisphenol A epoxy resin and an acrylic or methacrylic acid; a photosensitive, free radical generating initiator for polymerization of the acrylic monomer and oligomer; a curable epoxy resin; a curing agent for the epoxy resin; and, optionally, a crosslinking agent reactive with hydroxyl groups. After exposure and development of a layer of the photoimageable composition and etching of the underlying metal layer on a board, the resultant photoresist (16) is left on the circuitry traces (14). The innerlayers (10) of photoresist are stacked in a press where it initially conforms under heat and pressure to fill voids between the innerlayers and then cures to permanence. |
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After exposure and development of a layer of the photoimageable composition and etching of the underlying metal layer on a board, the resultant photoresist (16) is left on the circuitry traces (14). The innerlayers (10) of photoresist are stacked in a press where it initially conforms under heat and pressure to fill voids between the innerlayers and then cures to permanence.</description><edition>7</edition><language>ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PRINTED CIRCUITS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020915&DB=EPODOC&CC=AT&NR=E223142T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020915&DB=EPODOC&CC=AT&NR=E223142T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RATH, JAMES</creatorcontrib><creatorcontrib>KOES, THOMAS A</creatorcontrib><creatorcontrib>TARA, VINAI MING</creatorcontrib><creatorcontrib>NIZZO, VINCENT J</creatorcontrib><creatorcontrib>FLYNN, KATHY M</creatorcontrib><creatorcontrib>TRAN, WILLIAM LUONG-GIA</creatorcontrib><title>VERFAHREN UND ZUSAMMENSETZUNG ZUR HERSTELLUNG EINER MEHRSCHICHTIGEN LEITERPLATTE</title><description>In a process for fabricating a multilayer printed circuit board (20) with permanent innerlayers (10) of photoresist, the photo-imageable composition used to form the hard permanent layer comprises a polymerizable acrylate monomer; an oligomer consisting of the diester of a bisphenol A epoxy resin and an acrylic or methacrylic acid; a photosensitive, free radical generating initiator for polymerization of the acrylic monomer and oligomer; a curable epoxy resin; a curing agent for the epoxy resin; and, optionally, a crosslinking agent reactive with hydroxyl groups. After exposure and development of a layer of the photoimageable composition and etching of the underlying metal layer on a board, the resultant photoresist (16) is left on the circuitry traces (14). 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After exposure and development of a layer of the photoimageable composition and etching of the underlying metal layer on a board, the resultant photoresist (16) is left on the circuitry traces (14). The innerlayers (10) of photoresist are stacked in a press where it initially conforms under heat and pressure to fill voids between the innerlayers and then cures to permanence.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | VERFAHREN UND ZUSAMMENSETZUNG ZUR HERSTELLUNG EINER MEHRSCHICHTIGEN LEITERPLATTE |
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