POSITIONIERVORRICHTUNG

A positioning device comprising first and second supports (9,11) which are interconnected by a parallelogram mechanism of elastically deflexible rods (17), the first and second supports (9,11) together being displaceable in horizontal planes with a maintained position of the first support (9) in the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	BOUWER, ADRIANUS G
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT CONTROLLING DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METAL-WORKING NOT OTHERWISE PROVIDED FOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TRANSPORTING
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Beschreibung
Zusammenfassung:	A positioning device comprising first and second supports (9,11) which are interconnected by a parallelogram mechanism of elastically deflexible rods (17), the first and second supports (9,11) together being displaceable in horizontal planes with a maintained position of the first support (9) in the vertical direction, while with a maintained position of the first support (9) in a horizontal plane this support (9) is displaceable in the vertical direction by means of a substantially frictionless relative displacement of the second support (11) with respect to the first support (9) in the horizontal direction. The positioning device is particularly suitable for displacements of an object in the sub-micron range, such as, for example, in optical lithographic devices.