The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)
Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. T...
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| creator | Jiang, Hao Hong, Lianggou Venkatasubramanian, N Grant, John T Eyink, Kurt Wiacek, Kevin Fries-Carr, Sandra Enlow, Jesse Bunning, Timothy J |
| description | Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. These films, exhibiting highly cross-linked structures, pin-hole free bulk morphologies and smooth surfaces for a variety of film thicknesses, have been targeted for optical and dielectric applications such as waveguides, AR coatings, band-gap filters for integrated optics, and high performance dielectric devices. In this work, benzene and octafluorocyclobutane (OFCB) were chosen as starting precursors for exploring the relationship between structure and dielectric properties.
Prepared in collaboration with Materials Science and Technology Applications, LLC, Dayton, OH, and the University of Dayton Research Institute, Dayton, OH. |
| format | Report |
| fullrecord | <record><control><sourceid>dtic_1RU</sourceid><recordid>TN_cdi_dtic_stinet_ADA475005</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ADA475005</sourcerecordid><originalsourceid>FETCH-dtic_stinet_ADA4750053</originalsourceid><addsrcrecordid>eNqFyz0LwjAQgOEuDqL-A4cbdSgUtDj3w-JmwOwlJFd6kCblch3sr3fQ3ekdHt5t5vSI8BJerCyMYIKDltCjFSYLiuOMLIQJ4gDKmzSZXEX_npBpRQc1hhXD93t2TQ16pAAd-SnBSTHOTEHO-2wzGJ_w8OsuO3Z33TxyJ2T7JBRQ-qqtrreyKMrLH_4A1Ic6dg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>report</recordtype></control><display><type>report</type><title>The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)</title><source>DTIC Technical Reports</source><creator>Jiang, Hao ; Hong, Lianggou ; Venkatasubramanian, N ; Grant, John T ; Eyink, Kurt ; Wiacek, Kevin ; Fries-Carr, Sandra ; Enlow, Jesse ; Bunning, Timothy J</creator><creatorcontrib>Jiang, Hao ; Hong, Lianggou ; Venkatasubramanian, N ; Grant, John T ; Eyink, Kurt ; Wiacek, Kevin ; Fries-Carr, Sandra ; Enlow, Jesse ; Bunning, Timothy J ; AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH SURVIVABILITY AND SENSOR MATERIALS DIV/HARDENED MATERIALS</creatorcontrib><description>Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. These films, exhibiting highly cross-linked structures, pin-hole free bulk morphologies and smooth surfaces for a variety of film thicknesses, have been targeted for optical and dielectric applications such as waveguides, AR coatings, band-gap filters for integrated optics, and high performance dielectric devices. In this work, benzene and octafluorocyclobutane (OFCB) were chosen as starting precursors for exploring the relationship between structure and dielectric properties.
Prepared in collaboration with Materials Science and Technology Applications, LLC, Dayton, OH, and the University of Dayton Research Institute, Dayton, OH.</description><language>eng</language><subject>BENZENE ; CHEMICAL VAPOR DEPOSITION ; COATINGS ; CROSSLINKING(CHEMISTRY) ; DIELECTRIC PROPERTIES ; Electricity and Magnetism ; ENERGY BANDS ; ENERGY GAPS ; FILTERS ; Industrial Chemistry and Chemical Processing ; INTEGRATED OPTICS ; OFCB(OCTAFLUOROCYCLOBUTANE) ; OPTICAL PROPERTIES ; Optics ; PE62102F ; PECVD(PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION) ; POLYMERIZATION ; PRECURSORS ; PZ(PLASMA ZONE) ; ROOM TEMPERATURE ; THICKNESS ; THIN FILMS ; WAVEGUIDES ; WUAFRLM08R1000</subject><creationdate>2006</creationdate><rights>Approved for public release; distribution is unlimited.</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,776,881,27544,27545</link.rule.ids><linktorsrc>$$Uhttps://apps.dtic.mil/sti/citations/ADA475005$$EView_record_in_DTIC$$FView_record_in_$$GDTIC$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Jiang, Hao</creatorcontrib><creatorcontrib>Hong, Lianggou</creatorcontrib><creatorcontrib>Venkatasubramanian, N</creatorcontrib><creatorcontrib>Grant, John T</creatorcontrib><creatorcontrib>Eyink, Kurt</creatorcontrib><creatorcontrib>Wiacek, Kevin</creatorcontrib><creatorcontrib>Fries-Carr, Sandra</creatorcontrib><creatorcontrib>Enlow, Jesse</creatorcontrib><creatorcontrib>Bunning, Timothy J</creatorcontrib><creatorcontrib>AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH SURVIVABILITY AND SENSOR MATERIALS DIV/HARDENED MATERIALS</creatorcontrib><title>The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)</title><description>Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. These films, exhibiting highly cross-linked structures, pin-hole free bulk morphologies and smooth surfaces for a variety of film thicknesses, have been targeted for optical and dielectric applications such as waveguides, AR coatings, band-gap filters for integrated optics, and high performance dielectric devices. In this work, benzene and octafluorocyclobutane (OFCB) were chosen as starting precursors for exploring the relationship between structure and dielectric properties.
Prepared in collaboration with Materials Science and Technology Applications, LLC, Dayton, OH, and the University of Dayton Research Institute, Dayton, OH.</description><subject>BENZENE</subject><subject>CHEMICAL VAPOR DEPOSITION</subject><subject>COATINGS</subject><subject>CROSSLINKING(CHEMISTRY)</subject><subject>DIELECTRIC PROPERTIES</subject><subject>Electricity and Magnetism</subject><subject>ENERGY BANDS</subject><subject>ENERGY GAPS</subject><subject>FILTERS</subject><subject>Industrial Chemistry and Chemical Processing</subject><subject>INTEGRATED OPTICS</subject><subject>OFCB(OCTAFLUOROCYCLOBUTANE)</subject><subject>OPTICAL PROPERTIES</subject><subject>Optics</subject><subject>PE62102F</subject><subject>PECVD(PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION)</subject><subject>POLYMERIZATION</subject><subject>PRECURSORS</subject><subject>PZ(PLASMA ZONE)</subject><subject>ROOM TEMPERATURE</subject><subject>THICKNESS</subject><subject>THIN FILMS</subject><subject>WAVEGUIDES</subject><subject>WUAFRLM08R1000</subject><fulltext>true</fulltext><rsrctype>report</rsrctype><creationdate>2006</creationdate><recordtype>report</recordtype><sourceid>1RU</sourceid><recordid>eNqFyz0LwjAQgOEuDqL-A4cbdSgUtDj3w-JmwOwlJFd6kCblch3sr3fQ3ekdHt5t5vSI8BJerCyMYIKDltCjFSYLiuOMLIQJ4gDKmzSZXEX_npBpRQc1hhXD93t2TQ16pAAd-SnBSTHOTEHO-2wzGJ_w8OsuO3Z33TxyJ2T7JBRQ-qqtrreyKMrLH_4A1Ic6dg</recordid><startdate>200609</startdate><enddate>200609</enddate><creator>Jiang, Hao</creator><creator>Hong, Lianggou</creator><creator>Venkatasubramanian, N</creator><creator>Grant, John T</creator><creator>Eyink, Kurt</creator><creator>Wiacek, Kevin</creator><creator>Fries-Carr, Sandra</creator><creator>Enlow, Jesse</creator><creator>Bunning, Timothy J</creator><scope>1RU</scope><scope>BHM</scope></search><sort><creationdate>200609</creationdate><title>The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)</title><author>Jiang, Hao ; Hong, Lianggou ; Venkatasubramanian, N ; Grant, John T ; Eyink, Kurt ; Wiacek, Kevin ; Fries-Carr, Sandra ; Enlow, Jesse ; Bunning, Timothy J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-dtic_stinet_ADA4750053</frbrgroupid><rsrctype>reports</rsrctype><prefilter>reports</prefilter><language>eng</language><creationdate>2006</creationdate><topic>BENZENE</topic><topic>CHEMICAL VAPOR DEPOSITION</topic><topic>COATINGS</topic><topic>CROSSLINKING(CHEMISTRY)</topic><topic>DIELECTRIC PROPERTIES</topic><topic>Electricity and Magnetism</topic><topic>ENERGY BANDS</topic><topic>ENERGY GAPS</topic><topic>FILTERS</topic><topic>Industrial Chemistry and Chemical Processing</topic><topic>INTEGRATED OPTICS</topic><topic>OFCB(OCTAFLUOROCYCLOBUTANE)</topic><topic>OPTICAL PROPERTIES</topic><topic>Optics</topic><topic>PE62102F</topic><topic>PECVD(PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION)</topic><topic>POLYMERIZATION</topic><topic>PRECURSORS</topic><topic>PZ(PLASMA ZONE)</topic><topic>ROOM TEMPERATURE</topic><topic>THICKNESS</topic><topic>THIN FILMS</topic><topic>WAVEGUIDES</topic><topic>WUAFRLM08R1000</topic><toplevel>online_resources</toplevel><creatorcontrib>Jiang, Hao</creatorcontrib><creatorcontrib>Hong, Lianggou</creatorcontrib><creatorcontrib>Venkatasubramanian, N</creatorcontrib><creatorcontrib>Grant, John T</creatorcontrib><creatorcontrib>Eyink, Kurt</creatorcontrib><creatorcontrib>Wiacek, Kevin</creatorcontrib><creatorcontrib>Fries-Carr, Sandra</creatorcontrib><creatorcontrib>Enlow, Jesse</creatorcontrib><creatorcontrib>Bunning, Timothy J</creatorcontrib><creatorcontrib>AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH SURVIVABILITY AND SENSOR MATERIALS DIV/HARDENED MATERIALS</creatorcontrib><collection>DTIC Technical Reports</collection><collection>DTIC STINET</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jiang, Hao</au><au>Hong, Lianggou</au><au>Venkatasubramanian, N</au><au>Grant, John T</au><au>Eyink, Kurt</au><au>Wiacek, Kevin</au><au>Fries-Carr, Sandra</au><au>Enlow, Jesse</au><au>Bunning, Timothy J</au><aucorp>AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH SURVIVABILITY AND SENSOR MATERIALS DIV/HARDENED MATERIALS</aucorp><format>book</format><genre>unknown</genre><ristype>RPRT</ristype><btitle>The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)</btitle><date>2006-09</date><risdate>2006</risdate><abstract>Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. These films, exhibiting highly cross-linked structures, pin-hole free bulk morphologies and smooth surfaces for a variety of film thicknesses, have been targeted for optical and dielectric applications such as waveguides, AR coatings, band-gap filters for integrated optics, and high performance dielectric devices. In this work, benzene and octafluorocyclobutane (OFCB) were chosen as starting precursors for exploring the relationship between structure and dielectric properties.
Prepared in collaboration with Materials Science and Technology Applications, LLC, Dayton, OH, and the University of Dayton Research Institute, Dayton, OH.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BENZENE CHEMICAL VAPOR DEPOSITION COATINGS CROSSLINKING(CHEMISTRY) DIELECTRIC PROPERTIES Electricity and Magnetism ENERGY BANDS ENERGY GAPS FILTERS Industrial Chemistry and Chemical Processing INTEGRATED OPTICS OFCB(OCTAFLUOROCYCLOBUTANE) OPTICAL PROPERTIES Optics PE62102F PECVD(PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION) POLYMERIZATION PRECURSORS PZ(PLASMA ZONE) ROOM TEMPERATURE THICKNESS THIN FILMS WAVEGUIDES WUAFRLM08R1000 |
| title | The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint) |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-21T14%3A59%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-dtic_1RU&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=unknown&rft.btitle=The%20Structure%20and%20Dielectric%20Properties%20of%20Plasma-Polymerized%20Benzene%20and%20OFCB%20Thin%20Films%20(Preprint)&rft.au=Jiang,%20Hao&rft.aucorp=AIR%20FORCE%20RESEARCH%20LAB%20WRIGHT-PATTERSON%20AFB%20OH%20SURVIVABILITY%20AND%20SENSOR%20MATERIALS%20DIV/HARDENED%20MATERIALS&rft.date=2006-09&rft_id=info:doi/&rft_dat=%3Cdtic_1RU%3EADA475005%3C/dtic_1RU%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |