Realization of vertical metal semiconductor heterostructures via solution phase epitaxy
The creation of crystal phase heterostructures of transition metal chalcogenides, e.g., the 1T/2H heterostructures, has led to the formation of metal/semiconductor junctions with low potential barriers. Very differently, post-transition metal chalcogenides are semiconductors regardless of their phas...
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Veröffentlicht in: | Nature communications 2018-09, Vol.9 (1), p.3611-11, Article 3611 |
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Hauptverfasser: | , , , , , , , , , , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The creation of crystal phase heterostructures of transition metal chalcogenides, e.g., the 1T/2H heterostructures, has led to the formation of metal/semiconductor junctions with low potential barriers. Very differently, post-transition metal chalcogenides are semiconductors regardless of their phases. Herein, we report, based on experimental and simulation results, that alloying between 1T-SnS
2
and 1T-WS
2
induces a charge redistribution in Sn and W to realize metallic Sn
0.5
W
0.5
S
2
nanosheets. These nanosheets are epitaxially deposited on surfaces of semiconducting SnS
2
nanoplates to form vertical heterostructures. The ohmic-like contact formed at the Sn
0.5
W
0.5
S
2
/SnS
2
heterointerface affords rapid transport of charge carriers, and allows for the fabrication of fast photodetectors. Such facile charge transfer, combined with a high surface affinity for acetone molecules, further enables their use as highly selective 100 ppb level acetone sensors. Our work suggests that combining compositional and structural control in solution-phase epitaxy holds promises for solution-processible thin-film optoelectronics and sensors.
Controlling the composition and crystal phase of layered heterostructures is important. Here, the authors report the liquid-phase epitaxial growth of Sn
0.5
W
0.5
S
2
nanosheets with 83% metallic phase on SnS
2
nanoplates, which are used as 100 ppb level chemiresistive gas sensors at room temperature. |
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ISSN: | 2041-1723 2041-1723 |
DOI: | 10.1038/s41467-018-06053-z |