Effect of methyl terminal and ethylene bridging groups on porous organosilicate glass films: FTIR, ellipsometric porosimetry, luminescence dataset
A dataset in this report is regarding an article, “A detailed ellipsometric porosimetry and positron annihilation spectroscopy study of porous organosilicate glass films with various ratios of methyl terminal and ethylene bridging groups” [1]. The data of porous organosilicate glass (OSG) low-k film...
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Veröffentlicht in: | Data in brief 2021-04, Vol.35, p.106895-106895, Article 106895 |
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Sprache: | eng |
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Zusammenfassung: | A dataset in this report is regarding an article, “A detailed ellipsometric porosimetry and positron annihilation spectroscopy study of porous organosilicate glass films with various ratios of methyl terminal and ethylene bridging groups” [1]. The data of porous organosilicate glass (OSG) low-k films was obtained by Fourier-Transform Infrared spectroscopy (FTIR), Ellipsometric Porosimetry (EP), Photoluminescence (PL) Spectroscopy. The data shows that the mechanical properties of OSG low-k films are principally controlled by introducing both terminal methyl and bridging organic groups, and porosity with proper pore size. The dataset presented here gives additional details regarding properties of carbon bridged OSGs presented in the paper [1]. Also, the data may give the impact of both terminal methyl and bridging ethylene groups on as deposited and thermally cured OSG films. Particularly, we added some details about FTIR, EP (especially related to calculation of the internal surface area) and UV induced luminescence. The data allow to test experimental and theoretical investigations of OSG low-k materials that might use in microelectronic fabrication industry and also might be used to extend beyond the analysis reported in the accompanying manuscript, and may aid for other applications of OSG materials. |
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ISSN: | 2352-3409 2352-3409 |
DOI: | 10.1016/j.dib.2021.106895 |