Fabrication of Spin Coater Device using Hematocrit Centrifuge with Vacuum Substrate Holder for Thin Film Deposition

One of the most important thin film deposition techniques on a silicon, quartz or sapphire substrate in the world is the spin coating method. Hematocrit centrifuge was used to elaborately manufacture the spin coating machine from affordable materials without vibrations. The vacuum holder substrate in this system is used for substrate adhesion. This method provides a dimensionally free substrate with appropriate adhesion for sedimentation upon high-speed spinning. A platinum thin film was deposited on a fluorine-doped tin oxide glass (FTO) substrate with a specific concentration of hexa-chloroplatinic acid. Platinum thin films were investigated by Field Emission Scanning Electron Microscope (FESEM) and UV-Vis spectroscopy. FESEM displays successfully produced platinum thin films. The results showed a platinum film transmittance decrement with increasing of hexachloro-platinic acid content. Therefore, the suggested spin coater in this work can deposit platinum thin films with high transmittance up to (98 a.u.).