Data publication: Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission

Modification of spin-on-deposited porous PMO (periodic mesoporous organosilica) ultralow-k (ULK) SiCOH films (k = 2.33) containing both methyl terminal and methylene bridging groups by vacuum ultraviolet (VUV) emission from Xe plasma is studied. The temporal evolution of chemical composition, intern...

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Hauptverfasser:	Zotovich, Alexey I., Zyryanov, Sergey M., Lopaev, Dmitry V., Rezvanov, Askar A., Attallah, Ahmed Gamal, Liedke, Maciej Oskar, Butterling, Maik, Bogdanova, Maria A., Vishnevskiy, Alexey S., Seregin, Dmitry S., Vorotyntsev, Dmitry A. Vorotyntsev, Palov, Alexander P., Hirschmann, Eric, Wagner, Andreas, Naumov, Sergej, Vorotilov, Konstantin A., Rakhimova, Tatyana V., Rakhimov, Alexander T. R., Baklanov, Mikhail
Format:	Dataset
Sprache:	eng
Schlagworte:	in situ ellipsometry porosimetry positron-annihilation spectroscopy ultralow-k materials vacuum ultraviolet emission
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