Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering

GaAs thin films with Ti incorporated, to which we refer to as GaAs(Ti), have been deposited by R.F. sputtering on fused silica and c-GaAs substrates under different process conditions. The films were characterized by EPMA, XPS and XRD to study the composition and structural dependence on the deposit...

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Veröffentlicht in:	Journal of non-crystalline solids 2013-01, Vol.359, p.21-26
Hauptverfasser:	Boronat, A., Silvestre, S., Castañer, L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Cèl·lules solars Deposition by sputtering Enginyeria de la telecomunicació Exact sciences and technology Fotònica GaAs(Ti) Iii-v semiconductors Intermediate band (IB) Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Solar cells Sputtering Telecomunicació òptica Àrees temàtiques de la UPC
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