Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates

The structural and magnetic properties of Si(100)/MgO/Co 2 Fe 0.4 Mn 0.6 Si (CFMS) Heusler alloy thin films were systematically investigated. Highly B2-ordered CFMS Heusler films with an ordering parameter of ca. 70–80% were obtained by both the insertion of a very thin Mg layer into the Si/MgO inte...

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Veröffentlicht in:Japanese Journal of Applied Physics 2016-08, Vol.55 (8), p.88001
Hauptverfasser: Koike, Takeo, Oogane, Mikihiko, Ono, Atsuo, Ando, Yasuo
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container_title Japanese Journal of Applied Physics
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creator Koike, Takeo
Oogane, Mikihiko
Ono, Atsuo
Ando, Yasuo
description The structural and magnetic properties of Si(100)/MgO/Co 2 Fe 0.4 Mn 0.6 Si (CFMS) Heusler alloy thin films were systematically investigated. Highly B2-ordered CFMS Heusler films with an ordering parameter of ca. 70–80% were obtained by both the insertion of a very thin Mg layer into the Si/MgO interfaces to prevent oxidation of the Si surface and the optimization of the annealing temperature for the CFMS films. The prepared CFMS films exhibited high magnetization close to that of the CFMS bulk. Such highly B2-ordered CFMS films are very useful for realizing high spin injection efficiency in Si because of the half-metallicity of the CFMS films.
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fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_7567_JJAP_55_088001</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_7567_JJAP_55_088001</sourcerecordid><originalsourceid>FETCH-LOGICAL-c841-f475381c08a84f1b8db26aefa79f6d8269b81bc4e76235801076b43eec1df9303</originalsourceid><addsrcrecordid>eNotkD1PwzAURS0EEqGwMr8_kPD87YxVRClVEUh0YIvsxKZBaYPsdMi_J1WZjq6u7h0OIY8UCy2Vftpslh-FlAUag0ivSEa50LlAJa9JhshoLkrGbsldSj9zVFLQjHytrItdY8duOMIQYN997_sJhtj66FuoBmCw8oCFgLfjDAWfHaz9KfU-gu37YYLQ9YcE83xu0smlMdrRp3tyE2yf_MM_F2S3et5V63z7_vJaLbd5YwTNg9CSG9qgsUYE6kzrmLI-WF0G1RqmSmeoa4TXinFpkKJWTnDvG9qGkiNfkOJy28QhpehD_Ru7g41TTbE-a6nPWmop64sW_gc0i1MY</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Koike, Takeo ; Oogane, Mikihiko ; Ono, Atsuo ; Ando, Yasuo</creator><creatorcontrib>Koike, Takeo ; Oogane, Mikihiko ; Ono, Atsuo ; Ando, Yasuo</creatorcontrib><description>The structural and magnetic properties of Si(100)/MgO/Co 2 Fe 0.4 Mn 0.6 Si (CFMS) Heusler alloy thin films were systematically investigated. Highly B2-ordered CFMS Heusler films with an ordering parameter of ca. 70–80% were obtained by both the insertion of a very thin Mg layer into the Si/MgO interfaces to prevent oxidation of the Si surface and the optimization of the annealing temperature for the CFMS films. The prepared CFMS films exhibited high magnetization close to that of the CFMS bulk. Such highly B2-ordered CFMS films are very useful for realizing high spin injection efficiency in Si because of the half-metallicity of the CFMS films.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.7567/JJAP.55.088001</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2016-08, Vol.55 (8), p.88001</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c841-f475381c08a84f1b8db26aefa79f6d8269b81bc4e76235801076b43eec1df9303</citedby><cites>FETCH-LOGICAL-c841-f475381c08a84f1b8db26aefa79f6d8269b81bc4e76235801076b43eec1df9303</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Koike, Takeo</creatorcontrib><creatorcontrib>Oogane, Mikihiko</creatorcontrib><creatorcontrib>Ono, Atsuo</creatorcontrib><creatorcontrib>Ando, Yasuo</creatorcontrib><title>Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates</title><title>Japanese Journal of Applied Physics</title><description>The structural and magnetic properties of Si(100)/MgO/Co 2 Fe 0.4 Mn 0.6 Si (CFMS) Heusler alloy thin films were systematically investigated. Highly B2-ordered CFMS Heusler films with an ordering parameter of ca. 70–80% were obtained by both the insertion of a very thin Mg layer into the Si/MgO interfaces to prevent oxidation of the Si surface and the optimization of the annealing temperature for the CFMS films. The prepared CFMS films exhibited high magnetization close to that of the CFMS bulk. Such highly B2-ordered CFMS films are very useful for realizing high spin injection efficiency in Si because of the half-metallicity of the CFMS films.</description><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNotkD1PwzAURS0EEqGwMr8_kPD87YxVRClVEUh0YIvsxKZBaYPsdMi_J1WZjq6u7h0OIY8UCy2Vftpslh-FlAUag0ivSEa50LlAJa9JhshoLkrGbsldSj9zVFLQjHytrItdY8duOMIQYN997_sJhtj66FuoBmCw8oCFgLfjDAWfHaz9KfU-gu37YYLQ9YcE83xu0smlMdrRp3tyE2yf_MM_F2S3et5V63z7_vJaLbd5YwTNg9CSG9qgsUYE6kzrmLI-WF0G1RqmSmeoa4TXinFpkKJWTnDvG9qGkiNfkOJy28QhpehD_Ru7g41TTbE-a6nPWmop64sW_gc0i1MY</recordid><startdate>20160801</startdate><enddate>20160801</enddate><creator>Koike, Takeo</creator><creator>Oogane, Mikihiko</creator><creator>Ono, Atsuo</creator><creator>Ando, Yasuo</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20160801</creationdate><title>Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates</title><author>Koike, Takeo ; Oogane, Mikihiko ; Ono, Atsuo ; Ando, Yasuo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c841-f475381c08a84f1b8db26aefa79f6d8269b81bc4e76235801076b43eec1df9303</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Koike, Takeo</creatorcontrib><creatorcontrib>Oogane, Mikihiko</creatorcontrib><creatorcontrib>Ono, Atsuo</creatorcontrib><creatorcontrib>Ando, Yasuo</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Koike, Takeo</au><au>Oogane, Mikihiko</au><au>Ono, Atsuo</au><au>Ando, Yasuo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2016-08-01</date><risdate>2016</risdate><volume>55</volume><issue>8</issue><spage>88001</spage><pages>88001-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>The structural and magnetic properties of Si(100)/MgO/Co 2 Fe 0.4 Mn 0.6 Si (CFMS) Heusler alloy thin films were systematically investigated. Highly B2-ordered CFMS Heusler films with an ordering parameter of ca. 70–80% were obtained by both the insertion of a very thin Mg layer into the Si/MgO interfaces to prevent oxidation of the Si surface and the optimization of the annealing temperature for the CFMS films. The prepared CFMS films exhibited high magnetization close to that of the CFMS bulk. Such highly B2-ordered CFMS films are very useful for realizing high spin injection efficiency in Si because of the half-metallicity of the CFMS films.</abstract><doi>10.7567/JJAP.55.088001</doi></addata></record>
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title Fabrication of highly ordered Co 2 Fe 0.4 Mn 0.6 Si Heusler alloy films on Si substrates
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T04%3A24%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Fabrication%20of%20highly%20ordered%20Co%202%20Fe%200.4%20Mn%200.6%20Si%20Heusler%20alloy%20films%20on%20Si%20substrates&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Koike,%20Takeo&rft.date=2016-08-01&rft.volume=55&rft.issue=8&rft.spage=88001&rft.pages=88001-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.7567/JJAP.55.088001&rft_dat=%3Ccrossref%3E10_7567_JJAP_55_088001%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true