Relationship between center-peaked plasma density profiles and harmonic electromagnetic waves in very high frequency capacitively coupled plasma reactors

An understanding of the factors that control radial plasma uniformity in very high frequency (VHF) capacitively coupled plasma (CCP) sources is important for many plasma processes in semiconductor device manufacturing. Here, we report experimental measurements and high-resolution self-consistent num...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2014-03, Vol.53 (3S2), p.3-1-03DB01-6
Hauptverfasser:	Sawada, Ikuo, Ventzek, Peter L. G., Lane, Barton, Ohshita, Tatsuro, Upadhyay, Rochan R., Raja, Laxminarayan L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Computer simulation Electron density Joining Mathematical models Plasma (physics) Plasma density Reactors UHF Very high frequencies
Online-Zugang:	Volltext
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